Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Bruno Roland"'
Autor:
Bruno Roland
Publikováno v:
Advanced Materials for Optics and Electronics. 4:129-138
The issues of dry development and self-developing resists are addressed in this paper by way of an introduction to the main topic of surface imaging, in which diffusion-enhanced vapour plhase silylation chemistries and their mechanisms are developed
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2cc1c99686ffb8aa90cafe09e712b42f
https://doi.org/10.1002/amo.860040207
https://doi.org/10.1002/amo.860040207
Publikováno v:
Advances in Resist Technology and Processing X.
A simplified positive tone process using liquid phase silylation in DUV lithography is presented in this paper. The diffusion enhanced silylated resist (DESIRE) process has been demonstrated as an attractive solution not only to improve resolution an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bdff2741f91c9c9eda4326587f054cf1
https://doi.org/10.1117/12.154765
https://doi.org/10.1117/12.154765
Publikováno v:
SPIE Proceedings.
Liquid phase silylation is presented in this paper as a technique with improved silylation and dry development selectivity and hence improved process windows. Using this technique, the requirements imposed on silylation and dry development equipment
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::949f2f1602da9957c856ce10dcdf68e3
https://doi.org/10.1117/12.59736
https://doi.org/10.1117/12.59736
Autor:
Anne-Marie Goethals, David N. Nichols, Luc Van den Hove, Ria Lombaerts, Maaike Op de Beeck, Ki-Ho Baik, Bruno Roland, P. De Geyter
Publikováno v:
SPIE Proceedings.
The DESIRE1,2 process is based on selective silylation and subsequent dry development. A problem with silylation of resists is the volume expansion3 of the resist image, which results in pattern deformation and displacement of small features near lar
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::042441c65357f48b13f044f75a8a2c9f
https://doi.org/10.1117/12.20116
https://doi.org/10.1117/12.20116
Publikováno v:
SPIE Proceedings.
The quality of resist profiles obtained In surface Imaging techniques based on selective diffusion of a silylating agent and subsequent dry development depends on the sificon distribution after silylatlon and the quality of the transfer of this silic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::424054218a669777d78666dbf2da5dad
https://doi.org/10.1117/12.20098
https://doi.org/10.1117/12.20098
Publikováno v:
SPIE Proceedings.
In surface imaging, dry developed resist systems, based on gas phase silylation, profiles are mainly determined by the silicon distribution between the exposed and the unexposed areas in the upper part of the resist, and by the dry etching process th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3a17fc196dd23bbbbfdf3bf57f7c92a9
https://doi.org/10.1117/12.20124
https://doi.org/10.1117/12.20124
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 10:1229
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1b7cf8c1e792f75fa361836b2ef7f13c
https://doi.org/10.1116/1.585896
https://doi.org/10.1116/1.585896
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 9:3399
Surface imaging in combination with dry development has been suggested as a means of overcoming the inherent limitations present in conventional wet develop lithography. The diffusion‐enhanced silylated resist process has been demonstrated as one s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0d99f45b70fb7987fdc55d185c15f0ba
https://doi.org/10.1116/1.585348
https://doi.org/10.1116/1.585348
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 8:1481
The diffusion enhanced silylated resist (DESIRE) process has been presented as one of the most attractive surface imaging technologies for advanced optical lithography. It has been shown that the silylation step, usually carried out in a hexamethyldi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f86d89a3b1f226f604bf88b6f863fd00
https://doi.org/10.1116/1.585101
https://doi.org/10.1116/1.585101
Autor:
Johannes Smid, Bruno Roland
Publikováno v:
Polymer. 25:1166-1172
Binding constants of 1-pyrenebutyrate (PB − , 1-pyrenecarboxylate and 1-pyrenevaleriate to the polysoap-type macromolecule poly(vinylbenzo-18-crown-6) (P18C6) and the poly(vinylbenzoglyme) PVBG (a polystyrene with two CH 3 O(CH 2 CH 2 O) 2 -substit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5b56c784ee4b40e529798c3f3262a6b3
https://doi.org/10.1016/0032-3861(84)90358-6
https://doi.org/10.1016/0032-3861(84)90358-6