Zobrazeno 1 - 10
of 29
pro vyhledávání: '"Bruno Lépine"'
Autor:
Bienlo Flora Zerbo, Mircea Modreanu, Ian Povey, Jun Lin, Antoine Létoublon, Alain Rolland, Laurent Pédesseau, Jacky Even, Bruno Lépine, Pascal Turban, Philippe Schieffer, Alain Moréac, Olivier Durand
Publikováno v:
Crystals, Vol 12, Iss 10, p 1363 (2022)
Silicon-based heterojunction (SHJ) solar cells demonstrate high efficiencies over their homojunction counterparts, revealing the potential of such technologies. We present here the first steps towards the development of molybdenum disulfide (MoS2)/c-
Externí odkaz:
https://doaj.org/article/887267700e23466da84f3d01a9d76452
Autor:
Jules Courtin, Alain Moréac, Gabriel Delhaye, Bruno Lépine, Sylvain Tricot, Pascal Turban, Philippe Schieffer, Jean-Christophe Le Breton
Publikováno v:
Applied Sciences, Vol 9, Iss 23, p 5014 (2019)
Fermi level pinning at metal/semiconductor interfaces forbids a total control over the Schottky barrier height. 2D materials may be an interesting route to circumvent this problem. As they weakly interact with their substrate through Van der Waals fo
Externí odkaz:
https://doaj.org/article/cc60f5b58895426ab69febcb66b88d90
Autor:
Bienlo Flora Christine Zerbo, Mircea Modreanu, Antoine Létoublon, Alain Rolland, Laurent Pedesseau, Jacky Even, Bruno Lépine, Pascal Turban, Philippe Schieffer, Alain Moréac, Olivier Durand
Publikováno v:
Physics, Simulation, and Photonic Engineering of Photovoltaic Devices XI.
Autor:
Laurent Pedesseau, Mircea Modreanu, Philippe Schieffer, Antoine Létoublon, Jacky Even, Bruno Lépine, Pascal Turban, Alain Moréac, Olivier Durand, Bienlo Zerbo, Alain Rolland, Ian M. Povey
Publikováno v:
IEEE Xplore
44th International Semiconductor Conference (CAS 2021)
44th International Semiconductor Conference (CAS 2021), Oct 2021, Online, Romania. ⟨10.1109/CAS52836.2021.9604140⟩
44th International Semiconductor Conference (CAS 2021)
44th International Semiconductor Conference (CAS 2021), Oct 2021, Online, Romania. ⟨10.1109/CAS52836.2021.9604140⟩
International audience; In this paper, we present the first steps of a process toward the development of MoS2/Si heterojunctions photovoltaics, using 2D 2H-MoS2, whose natural abundance and tunable bandgap make it suitable for such application. A foc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::44cdbd3a51ecb8411b7e6218131982fb
https://hal.science/hal-03796793
https://hal.science/hal-03796793
Autor:
Gabriel Delhaye, Philipp Aebi, Bruno Lépine, Sylvain Tricot, Thomas Jaouen, Guy Jézéquel, B. Hildebrand, Philippe Schieffer
Publikováno v:
Journal of Physical Chemistry C
Journal of Physical Chemistry C, American Chemical Society, 2017, 121 (8), pp.4363-4367. ⟨10.1021/acs.jpcc.6b12541⟩
Journal of Physical Chemistry C, 2017, 121 (8), pp.4363-4367. ⟨10.1021/acs.jpcc.6b12541⟩
Journal of Physical Chemistry C, American Chemical Society, 2017, 121 (8), pp.4363-4367. ⟨10.1021/acs.jpcc.6b12541⟩
Journal of Physical Chemistry C, 2017, 121 (8), pp.4363-4367. ⟨10.1021/acs.jpcc.6b12541⟩
International audience; Ultrathin MgO films grown on Ag(001) have been investigated using X-ray and ultraviolet photoemission spectroscopies for oxide films successively exposed to Mg and O-2 flux. Studying work functions and layer-resolved Auger shi
A low Schottky barrier height and transport mechanism in gold-graphene-silicon (001) heterojunctions
Autor:
Alain Moréac, Sylvain Tricot, Sylvain Le Gall, Pascal Turban, Pascal Chrétien, Bruno Lépine, Gabriel Delhaye, Jules Courtin, Jean-Christophe Le Breton, Philippe Schieffer
Publikováno v:
Nanoscale Advances
Nanoscale Advances, RSC, 2019, 1 (9), pp.3372-3378. ⟨10.1039/C9NA00393B⟩
Nanoscale Advances, 2019, 1 (9), pp.3372-3378. ⟨10.1039/C9NA00393B⟩
Nanoscale Advances, RSC, 2019, 1 (9), pp.3372-3378. ⟨10.1039/C9NA00393B⟩
Nanoscale Advances, 2019, 1 (9), pp.3372-3378. ⟨10.1039/C9NA00393B⟩
International audience; The interface resistance at metal/semiconductor junctions has been a key issue for decades. The control of this resistance is dependent on the possibility to tune the Schottky barrier height. However, Fermi level pinning in th
Autor:
Philippe Schieffer, Gabriel Delhaye, Sylvain Tricot, Bruno Lépine, Pascal Turban, Alain Moréac, Jules Courtin, Jean-Christophe Le Breton
Publikováno v:
Applied Sciences
Applied Sciences, 2019, 9 (23), pp.5014. ⟨10.3390/app9235014⟩
Applied Sciences, Vol 9, Iss 23, p 5014 (2019)
Applied Sciences, MDPI, 2019, 9 (23), pp.5014. ⟨10.3390/app9235014⟩
Volume 9
Issue 23
Applied Sciences, 2019, 9 (23), pp.5014. ⟨10.3390/app9235014⟩
Applied Sciences, Vol 9, Iss 23, p 5014 (2019)
Applied Sciences, MDPI, 2019, 9 (23), pp.5014. ⟨10.3390/app9235014⟩
Volume 9
Issue 23
International audience; Fermi level pinning at metal/semiconductor interfaces forbids a total control over the Schottky barrier height. 2D materials may be an interesting route to circumvent this problem. As they weakly interact with their substrate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4712da6dc2c3ed7ab053a87ed222aa63
https://hal.science/hal-02384497
https://hal.science/hal-02384497
Autor:
Sylvain Tricot, Philippe Schieffer, Gabriel Delhaye, Pascal Turban, P. Catrou, Bruno Lépine, J. C. Le Breton
Publikováno v:
Physical Review B. 98
We have investigated the interface formation at room temperature between Fe and ${\mathrm{TiO}}_{2}$-terminated ${\mathrm{SrTiO}}_{3}(001)$ surface using x-ray photoelectron spectroscopy. Oxygen vacancies within the ${\mathrm{SrTiO}}_{3}$ lattice in
Autor:
Surojit Pande, Sumita Choudhary, Pascal Turban, Subhashis Gangopadhyay, Soraya Ababou-Girard, J. V. N. Sarma, Bruno Lépine
Publikováno v:
AIP Advances
AIP Advances, 2018, 8 (5), pp. 055114. 〈10.1063/1.5028407〉
AIP Advances, American Institute of Physics-AIP Publishing LLC, 2018, 8 (5), pp.055114. ⟨10.1063/1.5028407⟩
AIP Advances, 2018, 8 (5), pp.055114. ⟨10.1063/1.5028407⟩
AIP Advances, Vol 8, Iss 5, Pp 055114-055114-16 (2018)
AIP Advances, 2018, 8 (5), pp. 055114. 〈10.1063/1.5028407〉
AIP Advances, American Institute of Physics-AIP Publishing LLC, 2018, 8 (5), pp.055114. ⟨10.1063/1.5028407⟩
AIP Advances, 2018, 8 (5), pp.055114. ⟨10.1063/1.5028407⟩
AIP Advances, Vol 8, Iss 5, Pp 055114-055114-16 (2018)
International audience; Controlled thermal oxidations of thin copper films at relatively lower temperatures (up to 500°C) leading towards the formation of a single phase of copper oxide are investigated where the oxidation temperature, duration, oxy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5e959696a78f45ca5372d14d3c84c508
https://hal-univ-rennes1.archives-ouvertes.fr/hal-01809058
https://hal-univ-rennes1.archives-ouvertes.fr/hal-01809058
Autor:
Bruno Lépine, Philippe Schieffer, Gabriel Delhaye, Sylvain Tricot, J. C. Le Breton, Pascal Turban
Publikováno v:
Journées Surface et Interfaces 2017
Journées Surface et Interfaces 2017, Jan 2017, Rennes, France
Applied Physics Letters
Applied Physics Letters, American Institute of Physics, 2016, 109 (5), pp.051601. ⟨10.1063/1.4960199⟩
Applied Physics Letters, 2016, 109 (5), pp.051601. ⟨10.1063/1.4960199⟩
International Conference on the Formation of Semiconductor Interfaces
International Conference on the Formation of Semiconductor Interfaces, Jul 2017, Hanover, Germany
Journées Surface et Interfaces 2017, Jan 2017, Rennes, France
Applied Physics Letters
Applied Physics Letters, American Institute of Physics, 2016, 109 (5), pp.051601. ⟨10.1063/1.4960199⟩
Applied Physics Letters, 2016, 109 (5), pp.051601. ⟨10.1063/1.4960199⟩
International Conference on the Formation of Semiconductor Interfaces
International Conference on the Formation of Semiconductor Interfaces, Jul 2017, Hanover, Germany
International audience; The control of tunnel contact resistance is of primary importance for semiconductor-based spintronic devices. This control is hardly achieved with conventional oxide-based tunnel barriers due to deposition-induced interface st
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a447af23ae71296788050729f3674a4a
https://hal.archives-ouvertes.fr/hal-01454880
https://hal.archives-ouvertes.fr/hal-01454880