Zobrazeno 1 - 10
of 25
pro vyhledávání: '"Bruineman, C."'
Autor:
Bayraktar, Muharrem, Liu, Fei, Bastiaens, Hubertus M.J., Bruineman, C., Vratzov, Boris, Bijkerk, F.
Publikováno v:
2018 Source Workshop
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::ca9211381100324dcab0c8efc82af5c6
https://research.utwente.nl/en/publications/monitoring-euv-and-duv-spectral-emission-ratios-of-a-high-power-euvl-source(3bb97ff5-5a9b-4c89-b96b-ef5e421f2fad).html
https://research.utwente.nl/en/publications/monitoring-euv-and-duv-spectral-emission-ratios-of-a-high-power-euvl-source(3bb97ff5-5a9b-4c89-b96b-ef5e421f2fad).html
Publikováno v:
2016 International Workshop on EUV and Soft X-Ray Sources
Emission from extreme ultraviolet (EUV) light sources for lithography and metrology applications needs to be maximized in a narrow wavelength band. On the other hand, these sources also emit radiation outside this wavelength band, extending into the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::d31a8df0f239096ffaf9aac06d33fe05
https://research.utwente.nl/en/publications/1ed416d6-9766-4393-ba17-a4be3265aff8
https://research.utwente.nl/en/publications/1ed416d6-9766-4393-ba17-a4be3265aff8
Publikováno v:
2015 International Symposium on Extreme Ultraviolet Lithography
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::4fac898baa0c78338e2170084dd09634
https://research.utwente.nl/en/publications/083a253b-0993-418c-84b3-295b820ac5d4
https://research.utwente.nl/en/publications/083a253b-0993-418c-84b3-295b820ac5d4
Akademický článek
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Autor:
Shmaenok, Leonid A., Bijkerk, Fred, Bruineman, C., Bastiaensen, R. K. F., Shevelko, Alexander P., Simanovski, Dmitrii M., Gladskikh, A. N., Bobashev, Sergei V.
Publikováno v:
Proceedings of SPIE; Nov1995, Issue 1, p113-121, 9p
Autor:
Takahashi, Tadayuki, den Herder, Jan-Willem A., Bautz, Mark, van Weers, H. J., den Herder, J. W., Jackson, B. D., Kooijman, P. P. K., Bruineman, C., Ravensberg, K., Bruijn, M. P., Rangarajan, B., van der Linden, A. J., Ridder, M. L., Leeman, M., van Leeuwen, B. J., Gotink, A., Kwast, S., van der Velde, T. J., Diesveld, J. R. H., Werner, C., Hamelinck, R. F. M. M.
Publikováno v:
Proceedings of SPIE; July 2014, Vol. 9144 Issue: 1 p91445R-91445R-10, 9053066p
Autor:
Bijkerk, F., Shmaenok, L.A., Louis, E., Voorma, H.J., Koster, N.B., Bruineman, C., Bastiaensen, R.K.F.J., van der Drift, E.W.J.M., Romijn, J., de Groot, L.E.M., Rousseeuw, B.A.C., Zijlstra, T., Platonov, Yu.Ya., Salashchenko, N.N.
Publikováno v:
Microelectronic Engineering; January 1996, Vol. 30 Issue: 1-4 p183-186, 4p
Autor:
Qiushi Huang, Viacheslav Medvedev, Toine van den Boogaard, Meer, R., Robbert van de Kruijs, Sebastiaan Huber, Bert Bastiaens, Bruineman, C., Vratsov, B., Eric Louis, Frederik Bijkerk
Publikováno v:
University of Twente Research Information (Pure Portal)
ISSUE=14;TITLE=14th ASML Technology Conference 2013
ISSUE=14;TITLE=14th ASML Technology Conference 2013
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::2c7adc73edc1ebec0c6927a1e81fe9af
https://research.utwente.nl/en/publications/23342ce9-f9a0-4904-8f72-5b6584bb544a
https://research.utwente.nl/en/publications/23342ce9-f9a0-4904-8f72-5b6584bb544a
Autor:
Bijkerk, F., Shmaenok, L.A., Shevelko, A.P., Bastiaensen, R.K.F.J., Bruineman, C., van Honk, A.G.J.R.
Publikováno v:
Microelectronic Engineering; February 1995, Vol. 27 Issue: 1-4 p299-301, 3p