Zobrazeno 1 - 10
of 280
pro vyhledávání: '"Bruce W Smith"'
Autor:
Jacob M Vigil, Patricia Pendleton, Patrick Coulombe, Kevin E Vowles, Joe Alcock, Bruce W Smith
Publikováno v:
Pain Research and Management, Vol 19, Iss 4, Pp e109-e114 (2014)
BACKGROUND: Mixed associations have been observed between various aspects of ‘social support’ and patient pain experiences
Externí odkaz:
https://doaj.org/article/5dafb25bce094dfc9eed51ed76b6bf40
Publikováno v:
Journal of Happiness Studies. 24:1145-1167
Publikováno v:
Optical and EUV Nanolithography XXXVI.
Publikováno v:
Optical and EUV Nanolithography XXXVI.
Publikováno v:
Optical and EUV Nanolithography XXXVI.
Publikováno v:
Handbook of Assessment in Mindfulness Research ISBN: 9783030776442
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fc779b98cdc97cc23d97ef352125200f
https://doi.org/10.1007/978-3-030-77644-2_92-1
https://doi.org/10.1007/978-3-030-77644-2_92-1
Publikováno v:
Handbook of Assessment in Mindfulness Research ISBN: 9783030776442
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::236557d86248af0e7f898b841057243b
https://doi.org/10.1007/978-3-030-77644-2_94-1
https://doi.org/10.1007/978-3-030-77644-2_94-1
Autor:
Rajiv Naresh Sejpal, Bruce W. Smith
Publikováno v:
Optical and EUV Nanolithography XXXV.
Publikováno v:
Journal of Happiness Studies. 22:343-362
This study investigated the effects of a character strength focused positive psychology course on student well-being. The Values in Action character strengths were each presented as ways to increase both individual and community well-being. There wer
Autor:
Rajiv N. Sejpal, Bruce W. Smith
Publikováno v:
Photomask Technology 2021.
Alternatives to Ta-based absorbers are being considered for next generation lithography nodes to reduce 3D mask effects and to improve image modulation through phase interference. Low complex refractive index (n – ik) materials can provide phase sh