Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Brian Kupczyk"'
Autor:
Xun Xiang, Abelardo Abel S. Garcia, John Scharer, Brian Kupczyk, Chien-Hao Liu, John H. Booske
Publikováno v:
IEEE Transactions on Plasma Science. 44:15-24
Recent improvements in high-power micro-wave (HPM) source power and portability make protecting sensitive electronics from electronic attack critically important. The research reported in this paper examined basic phenomena associated with a distribu
Publikováno v:
2014 IEEE 41st International Conference on Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS).
The efficacy of protecting electronics from high power microwaves (HPM) through plasma creation depends on how quickly the plasma forms in the protective gas chamber when illuminated with microwave radiation. A cylindrical chamber with polycarbonate
Publikováno v:
2013 Abstracts IEEE International Conference on Plasma Science (ICOPS).
Summary form only given. Development of high power microwave (HPM) distributed discharge limiters relies critically on minimizing the delay time between HPM incidence and diffuse plasma creation. We present a range of pulsed plasma experiments conduc
Publikováno v:
2013 Abstracts IEEE International Conference on Plasma Science (ICOPS).
Observations of rapidly formed (
Publikováno v:
2012 Abstracts IEEE International Conference on Plasma Science.
Summary form only given. Development of high power microwave (HPM) distributed discharge limiters relies critically on minimizing the delay time between HPM incidence and diffuse plasma creation. We present a series of pulsed plasma experiments condu
Publikováno v:
2011 Abstracts IEEE International Conference on Plasma Science.
Preliminary observations of rapidly formed (
Publikováno v:
Journal of Applied Physics. 116:059901
Publikováno v:
Journal of Applied Physics. 115:063301
We present measurements of high power (25.7 kW), pulsed (800 ns), X-band (9.382 GHz) microwave breakdown plasmas, including reflected power measurements, mixer reflected amplitude and phase measurements, optical emission spectroscopy (OES) measuremen