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Autor:
Jesse Enlow, Brian Habersberger, Bulent Akgun, Someswara R. Peri, Hao Jiang, Timothy J. Bunning, Mark D. Foster, Charles F. Majkrzak
Publikováno v:
Polymer. 51:4390-4397
Neutron reflectometry (NR) measurements of ultrathin films from octafluorocyclobutane (OFCB) and benzene (B) precursors deposited using Plasma Enhanced Chemical Vapor Deposition (PECVD) at two pressures (0.6 and 0.05 torr) reveal that under both depo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ebd0c7a32f8c54a0ca9b0c74d9e1aac6
https://doi.org/10.1016/j.polymer.2010.07.026
https://doi.org/10.1016/j.polymer.2010.07.026
