Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Brian, Hoang"'
Publikováno v:
Advances in Patterning Materials and Processes XXXV.
Airborne molecular contaminants continue to pose cost of ownership challenges in photolithography. Recent advances in understanding siloxane removal have led to the development of an innovative filtration configuration utilizing new media that works
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5e02ca13cdd6b75309df9ed09d8bc074
https://doi.org/10.1117/12.2297034
https://doi.org/10.1117/12.2297034
Publikováno v:
American Journal of Physiology-Gastrointestinal and Liver Physiology. 292:G1511-G1519
Mice deficient in the G-protein alpha subunit Giα2spontaneously develop colitis and colon cancer. IL-11 is a pleiotropic cytokine known to protect the intestinal epithelium from injury in animal models of colitis and is produced by subepithelial myo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3d1f0910ebf9d04be3e60561e7fe3a60
https://doi.org/10.1152/ajpgi.00307.2006
https://doi.org/10.1152/ajpgi.00307.2006
Publikováno v:
SPIE Proceedings.
Molecular bases have long been known to be a problem in photolithographic applications using chemically amplified photoresists. Of these molecular bases, ammonia and 1-methyl-2-pyrrolidinone (NMP) have been studied in the most detail since chemical f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::80f76c17c57c543973228582e62bbf31
https://doi.org/10.1117/12.654839
https://doi.org/10.1117/12.654839
Autor:
Jon Dennis Joriman, Andrew J. Dallas, Kevin Seguin, Jeremy Exley, Jonathan G. Parsons, Lefei Ding, Brian Hoang, Dustin Zastera
Publikováno v:
SPIE Proceedings.
Part per billion concentrations of acid gases such as SOx and NOx have been detected in both high purity gases and CDA lines. These contaminants can have deleterious effects on a number of high purity applications such as the optics found in lithogra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2770314b8630966dff2d405551d0e7f6
https://doi.org/10.1117/12.599815
https://doi.org/10.1117/12.599815
Autor:
Kevin Seguin, Brian Hoang, Lefei Ding, Andrew J. Dallas, Jonathan G. Parsons, Jon Dennis Joriman
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
The requirement to extend existing lithography equipment working levels and life has required manufacturers and end users to extend their filtration requirements beyond airborne base gases. Due to the effect acid gases can have on optics, masks, reti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::871d1a1d21183e93e518e061543456cc
https://doi.org/10.1117/12.534102
https://doi.org/10.1117/12.534102
Autor:
Jon Dennis Joriman, Jonathan G. Parsons, Kevin Seguin, Brian Hoang, William Lefei Ding, Andrew J. Dallas
Publikováno v:
SPIE Proceedings.
The optimal medium in which DUV resists are exposed is becoming increasingly under investigation by lithography tool manufacturers. These medium requirements have created even more design restrictions for effective filtration methods. Traditional air
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::56e441a317f235df37a4b3052f8e8600
https://doi.org/10.1117/12.485416
https://doi.org/10.1117/12.485416