Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Brent Riggs"'
Autor:
Christian Sparka, Brent Riggs, Karsten Gutjhar, Lipkong Yap, Bill Pierson, Miguel Garcia-Medina, Woong Jae Chung, Vidya Ramanathan, Onur N. Demirer, Ramkumar Karur-Shanmugam, Lokesh Subramany, John C. Robinson
Publikováno v:
2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
With the introduction of Nix process nodes, leading-edge factories are facing challenging demands in shrinking design margins. Previously uncorrected high-order signatures, and uncompensated temporal changes of high-order signatures, carry an importa
Autor:
Woong Jae Chung, Miguel Garcia-Medina, Lipkong Yap, Bill Pierson, John C. Robinson, Christian Sparka, Vidya Ramanathan, Karsten Gutjahr, Onur N. Demirer, Ramkumar Karur-Shanmugam, Brent Riggs, Lokesh Subramany
Publikováno v:
SPIE Proceedings.
With the introduction of N2x and N1x process nodes, leading-edge factories are facing challenging demands of shrinking design margins. Previously un-corrected high-order signatures, and un-compensated temporal changes of high-order signatures, carry
Autor:
Karsten Gutjahr, Vidya Ramanathan, Ramkumar Karur-Shanmugam, Sven Jug, Lipkong Yap, Woong Jae Chung, Yulei Sun, William Pierson, Jeong Soo Kim, Chin-Chou Kevin Huang, Young Ki Kim, John Tristan, Chen Li, Lokesh Subramany, Brent Riggs, Mark Yelverton, John C. Robinson
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
As photolithography will continue with 193nm immersion multiple patterning technologies for the leading edge HVM process node, the production overlay requirement for critical layers in logic devices has almost reached the scanner hardware performance