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pro vyhledávání: '"Brent E. Boerger"'
Publikováno v:
SPIE Proceedings.
Collimated laser-Plasma Lithography (CPL) offers potential to match Next Generation Lithography (NGL) needs, ending a pursuit of ever-larger lens NA and ever-smaller k1 process resolution factor. Powered by a laser-produced plasma (LPP) source at 1nm
Publikováno v:
SPIE Proceedings.
JMAR develops Laser-Produced Plasma (LPP) sources for lithography applications, and has specifically developed Collimated laser-Plasma Lithography (CPL) as a 1 nm collimated point source and stepper system to address sub-100nm lithography needs. We d
Autor:
Brent E. Boerger, Scott McLeod, Richard Forber, Jacob Ben-Jacob, I. C. Edmond Turcu, C. J. Gaeta, Donald K. Bailey
Publikováno v:
SPIE Proceedings.
In the world of micro- Lithography, several options exist for obtaining features below the 100nm level. Options include a variety of methods which range from additional process steps in etch, multilayer resist systems, or expensive throughput limited