Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Brent D. Schwab"'
Autor:
Christian Pizzetti, David DeKraker, Virginie Loup, Brent D. Schwab, Carlos Morote, Philippe Garnier, Marine Audouin, Laurence Gabette
Publikováno v:
Solid State Phenomena. 314:289-294
During silicide formation, unreacted NiPt metals is traditionally removed either by aqua regia (ESH concern) or SPM. This latter can easily degrade the device yield in HKMG (High K Metal Gate) nodes if the metal gates (usually TiN based) aren’t per
Autor:
Jeffrey M. Lauerhaas, Chimaobi W. Mbanaso, Jeffery W. Butterbaugh, Antonio L. P. Rotondaro, Derek W. Bassett, Gregory P. Thomes, Christina Ann Rathman, Brent D. Schwab
Publikováno v:
2019 China Semiconductor Technology International Conference (CSTIC).
Cryogenic Nano-Aerosol dry cleaning is an enabling technology for defect removal on substrates where wet cleaning techniques are not practical or are difficult to implement [1–4]. Example substrates are hydrophobic low-k films, films containing cor
Autor:
Michael Fussy, Thomas J. Wagener, Jeffery W. Butterbaugh, Brent D. Schwab, John Diedrick, Kurt K. Christenson, Nam Pyo Lee
Publikováno v:
Solid State Phenomena. 134:109-112
Autor:
Yong Pil Han, Kun Tack Lee, Woo Gwan Shim, Jeffery W. Butterbaugh, Brent D. Schwab, Sang-Yong Kim, Ron Hanestad
Publikováno v:
Solid State Phenomena. 92:203-206
Publikováno v:
Solid State Phenomena. :169-172
Autor:
Deborah J. Riley, Bruce Rosengren, Kurt K. Christenson, Thomas J. Wagener, Joel Barnett, Brent D. Schwab
Publikováno v:
Solid State Phenomena. 92:129-131