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pro vyhledávání: '"Bradley K. Smith"'
Autor:
Bradley K. Smith
Publikováno v:
Pennsylvania History: A Journal of Mid-Atlantic Studies. 75:86-90
Publikováno v:
Sensors and Actuators A: Physical. 70:159-163
This paper presents a method for depositing thin Teflon-like films using a commercial plasma reactor to eliminate adhesion or stiction in released polysilicon microstructures. A Lam 384T oxide etch system is used in a remote plasma mode with commerci
Autor:
J. Bur, James G. Fleming, Mihail M. Sigalas, Steven R. Kurtz, Bradley K. Smith, W. Zubrzycki, Shawn-Yu Lin, Kai-Ming Ho, Dale L. Hetherington, Rana Biswas
Publikováno v:
Nature. 394:251-253
The ability to confine and control light in three dimensions would have important implications for quantum optics and quantum-optical devices: the modification of black-body radiation, the localization of light to a fraction of a cubic wavelength, an
Autor:
Shawn-Yu Lin, James G. Fleming, Bradley K. Smith, K.M. Ho, Dale L. Hetherington, R. Biswas, Mihail M. Sigalas
Publikováno v:
Technical Digest. Summaries of Papers Presented at the Quantum Electronics and Laser Science Conference.
Summary form only given. A three-dimensional (3D) photonic crystal is an optical analog of a semiconductor that is useful for controlling and manipulating the flow of light on a semiconductor chip. The realization of high efficiency sub-/spl mu/A edg
Autor:
Bradley K. Smith, J.G. Fleming, K.M. Ho, Shawn-Yu Lin, W. Zubrzycki, Mihail M. Sigalas, Dale L. Hetherington, Rana Biswas
Publikováno v:
Conference Proceedings. LEOS'98. 11th Annual Meeting. IEEE Lasers and Electro-Optics Society 1998 Annual Meeting (Cat. No.98CH36243).
We report the realization of an infrared 3D photonic crystal built directly on a Si-wafer. Our 3D crystal shows a large photonic stop band from 10 to 14.5 /spl mu/m along the crystallographic direction, a strong attenuation constant of -12 dB per uni
Publikováno v:
Proceedings of International Solid State Sensors and Actuators Conference (Transducers '97).
This paper presents a method for depositing thin Teflon-like films using a commercial plasma reactor to eliminate adhesion or stiction in released polysilicon microstructures. A Lam 384T oxide etch system is used in a remote plasma mode with commerci
Publikováno v:
SPIE Proceedings.
This work presents film properties and initial reliability studies for thin Teflon-like films applied to a unique test vehicle, the Sandia-designed and fabricated microengine. Results on microengines coated with the film show a factor of three improv
Autor:
John D. Joannopoulos, Dale L. Hetherington, Edmond Chow, Rana Biswas, Walter J. Zubrzycki, James G. Fleming, Joel R. Wendt, Mihail M. Sigalas, K. M. Ho, B. E. Hammons, G. Allen Vawter, Steven R. Kurtz, Shawn-Yu Lin, Pierre R. Villeneuve, Bradley K. Smith
Publikováno v:
SPIE Proceedings.
In this paper, I describe realistic applications of photonic band gap (PBG) materials in optoelectronics at the mm-wave, IR and optical wavelength regimes. Examples are highly dispersive PBG-prisms and PBG-lasers. I will also describe our recent brea
Autor:
Stephen Montague, Bradley K. Smith, J. L. Rodriguez, Jeffry J. Sniegowski, James H. Smith, James G. Fleming, Carole Craig Barron
Publikováno v:
SPIE Proceedings.
An overview of the major sensor and actuator projects using the micromachining capabilities of the Microelectronics Development Laboratory at Sandia National Laboratories is presented. Development efforts are underway for a variety of micromechanical
Publikováno v:
MRS Proceedings. 68
Profile control in polysilicon etching with SF6/O2 and NF3/O2 gas mixtures has been explored as a function of feed gas composition, power, pressure and total flow.Polysilicon appears to etch anisotropically under certain anomalous combinations of the