Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Boris Tkachenko"'
Publikováno v:
Lecture Notes in Mechanical Engineering ISBN: 9783030407230
Increased application of workpiece fixtures at machining and introduction of computer-aided systems of fixture design call for the development of a new methodology for locating error determination. Generation of data for locating schemes is closely l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ea9dd6fbddb0de848f91dc3a43557828
https://doi.org/10.1007/978-3-030-40724-7_37
https://doi.org/10.1007/978-3-030-40724-7_37
Publikováno v:
Lecture Notes in Mechanical Engineering ISBN: 9783030407230
The article deals with issues of increasing the accuracy of horizontal boring operation adjusted for the variable rigidity of the process system. Regularities of machining errors generation are established by mathematical modeling of operation. Mathe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::49ee7b3bbb1284380ac13c810d28d2cc
https://doi.org/10.1007/978-3-030-40724-7_25
https://doi.org/10.1007/978-3-030-40724-7_25
Autor:
Andre Egbert, Boris N. Chichkov, P. V. Nickles, H. Stiel, Boris Tkachenko, Bjoern Mader, Carsten Fallnich
Publikováno v:
Applied Physics Letters. 81:2328-2330
A compact, high-repetition rate, ultrashort-pulse laser-driven hard-x-ray source based on the combination of a femtosecond laser system with an x-ray diode is demonstrated. A comparison with available laser-plasma sources is presented. Numerical mode
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f8d398d302487a3c8b6c5efa59e35f7c
https://doi.org/10.1063/1.1509858
https://doi.org/10.1063/1.1509858
Autor:
Boris Tkachenko, Max C. Schürmann, Sergiy Yulin, Torsten Feigl, Viatcheslav Nesterenko, Norbert Kaiser, Mark Schürmann
Publikováno v:
SPIE Proceedings.
As EUV lithography is on its way into production stage, studies of optics contamination and cleaning under realistic conditions become more and more important. Due to this fact an Exposure Test Stand (ETS) has been constructed at XTREME technologies
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::66a0331ca5b9b3b665b9e32c270172b2
https://doi.org/10.1117/12.891803
https://doi.org/10.1117/12.891803
Autor:
Sergiy Yulin, Boris Tkachenko, Max C. Schürmann, Torsten Feigl, Norbert Kaiser, Viatcheslav Nesterenko, Mark Schürmann
Publikováno v:
SPIE Proceedings.
Comparative lifetime studies of Mo/Si multilayer mirrors have been conducted at the Exposure Test Stand (ETS) using a pulsed Xe-discharge EUV source at XTREME Technologies GmbH (Gottingen, Germany). Due to the large, homogeneous exposed sample area a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1760eaeda107d1134c08d0c26631ef0e
https://doi.org/10.1117/12.848197
https://doi.org/10.1117/12.848197
Publikováno v:
2003 Conference on Lasers and Electro-Optics Europe (CLEO/Europe 2003) (IEEE Cat. No.03TH8666).
A compact ultrashort hard-x-ray source based on the combination of a high-repetition rate femtosecond laser with an x-ray diode is demonstrated. A detailed analysis of spectral, spatial, and temporal source characteristics is presented. The developme
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::afce093e3c8035ae5fcabd6f13ceb0b1
https://doi.org/10.1109/cleoe.2003.1313502
https://doi.org/10.1109/cleoe.2003.1313502
Publikováno v:
SPIE Proceedings.
A compact electron-based microfocus EUV/soft-x-ray source for applications in metrology and microscopy is developed. The source concept is based on the transfer of advanced microfocus x-ray tube technology into the EUV/soft-x-ray spectral range. This
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::652bc2407f9ee145a6f69b9fbe17af5c
https://doi.org/10.1117/12.554894
https://doi.org/10.1117/12.554894
Publikováno v:
High-Power Laser Ablation V.
A compact electron-based extreme ultraviolet (EUV) source for at-wavelength metrology is developed. The source concept is based on the transfer of advanced microfocus x-ray tube technology into the EUV spectral range. This allows the realization of a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::03deb660cf8210579b80a90cdf252b98
https://doi.org/10.1117/12.547029
https://doi.org/10.1117/12.547029
Publikováno v:
SPIE Proceedings.
A commercial extreme ultraviolet (EUV) source for at-wavelength metrology is developed. The source concept is based on the transfer of advanced microfocus x-ray tube technology into the EUV spectral range. This concept allows the realization of a com
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3201a09ebe417c8e235ca085d757b065
https://doi.org/10.1117/12.533019
https://doi.org/10.1117/12.533019
Autor:
Thomas Missalla, Max C. Schuermann, Rainer Lebert, Christian Wies, Larissa Juschkin, Roman M. Klein, Frank Scholze, Gerhard Ulm, Andre Egbert, Boris Tkachenko, Boris N. Chichkov
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0f7588f0e68f38d83546ec7c6556e479
https://doi.org/10.1117/12.556521
https://doi.org/10.1117/12.556521