In situ temperature control of molecular beam epitaxy growth using band-edge thermometry.

Autor: Johnson, Shane, Kuo, Chau-Hong, Boonzaayer, Martin, Braun, Wolfgang, Koelle, Ulrich, Zhang, Yong-Hang, Roth, John

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1998, Vol. 16 Issue 3, p1502-1506, 5p