Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Boon Cheng Goh"'
Publikováno v:
Solid State Phenomena. 134:217-220
Megasonic cleaning using de-gassed water (less than 2ppm N2, O2, CO2) in a 300mm batch immersion tool often does not give optimal particle performance, with particle streaks and clusters added onto the wafer, and low particle removal efficiency (PRE)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::40d52fa1a5ea9ed32313755ae1094fdb
https://doi.org/10.4028/www.scientific.net/ssp.134.217
https://doi.org/10.4028/www.scientific.net/ssp.134.217
Selected, peer reviewed papers from the 8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) held in Antwerp, Belgium, September 18-20, 2006
