Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Bois, Bert Du"'
Autor:
Passi, Vikram, Sodervall, Ulf, Nilsson, Bengt, Petersson, Goran, Hagberg, Mats, Krzeminski, Christophe, Dubois, Emmanuel, Bois, Bert Du, Raskin, Jean-Pierre
Publikováno v:
Microelectronic Engineering 95 (2012) 83-89
Damages are created in a sacrificial layer of silicon dioxide by ion implantation to enhance the etch rate of silicon-dioxide in liquid and vapor phase hydrofluoric acid. The etch rate ratio between implanted and unimplanted silicon dioxide is more t
Externí odkaz:
http://arxiv.org/abs/1207.2402
Autor:
Passi, Vikram, Dubois, Emmanuel, Lecestre, Aurelie, Linde, Alicia Sanchez, Bois, Bert Du, Raskin, Jean-Pierre
Publikováno v:
In Microelectronic Engineering March 2013 103:57-65
Autor:
Gupta, Mihir, Santermans, Sybren, Bois, Bert Du, Vos, Rita, Severi, Simone, Hellings, Geert, Lagae, Liesbet, Martens, Koen, Van Roy, Willem
Publikováno v:
IEEE Sensors Journal; 8/15/2020, Vol. 20 Issue 16, p8956-8964, 9p
Autor:
Guo, Bin, Seven, Simone, Bryce, George, Claes, Gert, Van Hoof, Rita, Bois, Bert Du, Haspeslagh, Luc, Witvrouw, Ann, Decoutere, Stefaan
Publikováno v:
Journal of The Electrochemical Society; 2010, Vol. 157 Issue 2, pD103-D110, 8p
Autor:
Witvrouw, Ann, Van, Rita, Bryce, George, Bois, Bert Du, Verbist, Agnes, Severi, Simone, Haspeslagh, Luc, Osman, Haris, Coster, Jeroen De, Wen, Lianggong, Puers, Robert, Beernaert, Roel, Smet, Herbert De, Rudra, Sukumar, Van, Dries
Publikováno v:
ECS Transactions; October 2010, Vol. 33 Issue: 6 p799-812, 14p
Autor:
Bryce, George, Severi, Simone, Bois, Bert Du, Willegems, Myriam, Claes, Gert, Van, Rita, Haspeslagh, Luc, Decoutere, Stefaan, Witvrouw, Ann
Publikováno v:
ECS Transactions; October 2008, Vol. 16 Issue: 10 p353-364, 12p
Publikováno v:
ECS Transactions; October 2006, Vol. 3 Issue: 9 p75-83, 9p