Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Bogumila Kutrzeba-Kotowska"'
Autor:
Kristof Lodewijks, Bharathkumar Mareddi, Rongchen Qin, Anabel De Proft, Bruno Figeys, Ugo Stella, Myriam Willegems, Roelof Jansen, Xavier Rottenberg, Eleonora Storace, Bogumila Kutrzeba-Kotowska
Publikováno v:
Optica Advanced Photonics Congress 2022.
Multispectral plasmonic color filters were fabricated using nano-imprint lithography and benchmarked to similar filters fabricated with standard CMOS processing. The self-aligned process yields devices with narrow linewidths below 30nm and up to 50%
Autor:
SandeepSeema Saseendran, Abhilash Paneri, Bert Tobback, Bogumila Kutrzeba-Kotowska, Emma Vecchio, Geraldine Jamieson, Vasile Paraschiv, HyoSeon Suh, Bruno Figeys, Masaki Fujikane, Atsushi Himeno, Kunihiko Nakamura, Naoki Tambo, Yuki Nakata, Hiroyuki Tanaka, Yasuyuki Naito, Kouhei Takahashi, DenizS Tezcan
Publikováno v:
Extended Abstracts of the 2020 International Conference on Solid State Devices and Materials.
Autor:
Brid Connolly, Nikolai Kasper, Ilan Englard, Gaoliang Dai, Kurt G. Ronse, Shimon Levi, Kenslea Anne, Laurens Kwakman, Hayley Johanesen, Markus Bender, Sven Krannich, Ishai Swrtsband, Bogumila Kutrzeba-Kotowska, Maxim Rabinovitch, Frank Scholze, Romy Wende, Igor Turovets, Vladislav Kaplan
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
Monitoring of pattern roughness for advanced technology nodes is crucial as this roughness can adversely affect device yield and degrade device performance. The main industry work horse for in-line roughness measurements is the CD-SEM, however, today
Autor:
Victor Blanco, Gayle Murdoch, S. Paolillo, Danny Wan, Christoph Adelmann, Bogumila Kutrzeba Kotowska, Nouredine Rassoul, Frederic Lazzarino, Christopher J. Wilson, Jürgen Bömmels, Zsolt Tokei, M. Ercken
Publikováno v:
2018 IEEE International Interconnect Technology Conference (IITC).
Ruthenium has been recently considered as a promising candidate to replace copper as the BEOL interconnect material for sub-5nm technology nodes. In this work, single level Ru interconnects were fabricated in imec's 300-mm pilot line using EUV lithog
Autor:
Basoene Briggs, Zaid El-Mekki, Jürgen Bömmels, Kurt G. Ronse, Stephane Lariviere, Peter De Bisschop, Dan Mocuta, Bogumila Kutrzeba Kotowska, Dieter Van den Heuvel, Joost Bekaert, Danny Wan, Greg McIntyre, Arindam Mallik, Nicolas Jourdan, Ivan Ciofi, Marleen H. van der Veen, Janko Versluijs, Patrick Verdonck, Ming Mao, Christopher J. Wilson, Els Kesters, Stefan Decoster, Victor Blanco, Zsolt Tőkei, Nancy Heylen, Christophe Beral, Eric Hendrickx, Ryoung-han Kim
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IX.
The semiconductor scaling roadmap shows the continuous node to node scaling to push Moore’s law down to the next generations. In that context, the foundry N5 node requires 32nm metal pitch interconnects for the advanced logic Back- End of Line (BEo
Autor:
Joost Bekaert, Vadim Timoshkov, Friso Wittebrood, Ming Mao, Stefan Decoster, Philippe Leray, Bogumila Kutrzeba Kotowska, Paul Colsters, Mark John Maslow, Greg McIntyre, Joern-Holger Franke, Emily Gallagher, Frederic Lazzarino, Ton Kiers, Stephane Lariviere, Paolo Di Lorenzo, Victor M. Blanco Carballo, Eric Hendrickx, Joep van Dijk, R. Ryoung-han Kim
Publikováno v:
SPIE Proceedings.
The imec N7 (iN7) platform has been developed to evaluate EUV patterning of advanced logic BEOL layers. Its design is based on a 42 nm first-level metal (M1) pitch, and a 32 nm pitch for the subsequent M2 layer. With these pitches, the iN7 node is an
Autor:
Francesco Galeotti1, Erika Kozma, Anita Eckstein-Andicsovà, Wojciech Mróz, Bogumila Kutrzeba-Kotowska
Publikováno v:
BIMAC2016, Bratislava, 06/09/2016, 09/09/2016
info:cnr-pdr/source/autori:Francesco Galeotti1, Erika Kozma, Anita Eckstein-Andicsovà, Wojciech Mróz, Bogumila Kutrzeba-Kotowska/congresso_nome:BIMAC2016/congresso_luogo:Bratislava/congresso_data:06%2F09%2F2016, 09%2F09%2F2016/anno:2016/pagina_da:/pagina_a:/intervallo_pagine
info:cnr-pdr/source/autori:Francesco Galeotti1, Erika Kozma, Anita Eckstein-Andicsovà, Wojciech Mróz, Bogumila Kutrzeba-Kotowska/congresso_nome:BIMAC2016/congresso_luogo:Bratislava/congresso_data:06%2F09%2F2016, 09%2F09%2F2016/anno:2016/pagina_da:/pagina_a:/intervallo_pagine
Luminescent polymer beads are obtained by self-assebmbly process called reverse breath figures.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=cnr_________::45ca00debe719d965bbbbedc17f71218
https://publications.cnr.it/doc/365454
https://publications.cnr.it/doc/365454
Publikováno v:
CM&L2015, Bologna, 21-23 settembre 2015
info:cnr-pdr/source/autori:Francesco Galeotti, Wojciech Mróz, Bogumila Kutrzeba-Kotowska, Anita Andicsova and Erika Kozma/congresso_nome:CM&L2015/congresso_luogo:Bologna/congresso_data:21-23 settembre 2015/anno:2015/pagina_da:/pagina_a:/intervallo_pagine
info:cnr-pdr/source/autori:Francesco Galeotti, Wojciech Mróz, Bogumila Kutrzeba-Kotowska, Anita Andicsova and Erika Kozma/congresso_nome:CM&L2015/congresso_luogo:Bologna/congresso_data:21-23 settembre 2015/anno:2015/pagina_da:/pagina_a:/intervallo_pagine
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=cnr_________::7c1a8c91bb62396590866ecc93ce452a
http://www.cnr.it/prodotto/i/336353
http://www.cnr.it/prodotto/i/336353