Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Bob Olshausen"'
Publikováno v:
SPIE Proceedings.
SLM-based DUV laser writers are gaining acceptance for 2 nd level PSM and binary mask patterning. These writers can use an e-beam compatible resist enabling tool and process sharing. For binary mask patterning, critical metrics include: critical dime
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7354ab06fa1d58d62602007dfd659a1a
https://doi.org/10.1117/12.633167
https://doi.org/10.1117/12.633167
Autor:
Ping Qu, Magnus Persson, Bob Olshausen, Bruce Auches, Thomas Ostrom, Mahesh Chandramouli, Jian Ma, Robert Eklund, Peter Goransson, Damon M. Cole, Angela Beyerl, Yulia Korobko, R Zerne, Tom Newman, Sven Henrichs
Publikováno v:
SPIE Proceedings.
Phase shift mask (PSM) applications are becoming essential for addressing the lithography requirements of the 65 nm technology node and beyond. Many mask writer properties must be under control to expose the second level of advanced PSM: second level
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::129f0c85860824c4e2cdf638bd1b0eea
https://doi.org/10.1117/12.617359
https://doi.org/10.1117/12.617359