Zobrazeno 1 - 10
of 71
pro vyhledávání: '"Bo-Yi Chou"'
Publikováno v:
IEEE Sensors Journal. 15:3359-3366
This paper uses H2O2 oxidation technique to grow Al2O3 on AlGaN/GaN heterostructure. The H2O2-grown-Al2O3 is served as a sensing membrane and a surface passivation layer. The contact angle of the ion-sensitive field-effect transistor (ISFET) with the
Autor:
Wen-Ching Sun, Sung-Yen Wei, Ching-Sung Lee, Wei-Chou Hsu, Bo-Yi Chou, Han-Yin Liu, Sheng-Min Yu, Chang-Luen Wu, Cheng-Long Yang
Publikováno v:
IEEE Transactions on Electron Devices. 62:1460-1466
Comparative studies for TiO2-passivated Al0.25Ga0.75N/GaN heterostructure FETs (HFETs) and TiO2-dielectric MOS-HFETs using nonvacuum ultrasonic spray pyrolysis deposition technique are made. Optimum device performances are obtained by tuning the laye
Publikováno v:
IEEE Photonics Technology Letters. 27:101-104
This letter demonstrates and investigates AlGaN/GaN metal–insulator–semiconductor ultraviolet photodetector (MIS-UV-PD) with a cost-effective wet oxidation technique. The H2O2 oxidation technique is adopted to grow an insulator layer. The materia
Publikováno v:
Journal of Materials Science and Chemical Engineering. :66-71
CrAlSiN with thickness up to 16 μm was deposited on tungsten carbide via multi-deposition process by cathode arc deposition technique. Scratch and water-sand jet impingement erosion tests were carried out to evaluate the adhesion by determining the
Autor:
Yi Hsuan Wang, Sheng Min Yu, Wei-Chou Hsu, Bo-Yi Chou, Sung Yen Wei, Han-Yin Liu, Meng-Hsueh Chiang, Wen Ching Sun
Publikováno v:
IEEE Transactions on Electron Devices. 61:4062-4069
This paper proposed Al 2 O 3 deposition by ultrasonic spray pyrolysis (USP) method as an insulator layer for Al 2 O 3 /AlGaN/GaN metal-insulator-semiconductor ultraviolet photodetector (MIS-UV-PD) applications. The composition of USP-grown Al 2 O 3 w
Composite HfO2/Al2O3-dielectric AlGaAs/InGaAs MOS-HEMTs by using RF sputtering/ozone water oxidation
Publikováno v:
Superlattices and Microstructures. 72:194-203
Composite HfO2/Al2O3-dielectric In0.2Ga0.8As/Al0.24Ga0.76As metal–oxide–semiconductor high-electron-mobility transistors (MOS-HEMTs) by using RF sputtering/ozone water oxidization, respectively, are investigated. In comparison with a conventional
Publikováno v:
IEEE Transactions on Electron Devices. 61:2760-2766
This paper investigates the temperature-dependent performances of AlGaN/GaN metal-oxide-semiconductor high electron mobility transistor (MOS-HEMT). The gate dielectric layer and surface passivation layer are formed by the H 2 O 2 oxidation technique.
Autor:
Sung-Yen Wei, Han-Yin Liu, Wei-Chou Hsu, Bo-Yi Chou, Yi-Hsuan Wang, Wen-Ching Sun, Sheng-Min Yu
Publikováno v:
IEEE Photonics Technology Letters. 26:1243-1246
This letter utilizes ultrasonic spray pyrolysis (USP) to deposit Al2O3 as the passivation layer of GaN light-emitting diodes (LEDs). The composition of Al2O3 is analyzed by X-ray photoelectron spectroscopy. The refractive index and transmittance of U
Autor:
Han-Yin Liu, Wei-Chou Hsu, Hsin Yuan Lee, Fu Chen Liao, Jung Hui Tsai, Bo-Yi Chou, Ching-Sung Lee
Publikováno v:
ECS Journal of Solid State Science and Technology. 3:N115-N119
Publikováno v:
IEEE Photonics Technology Letters. 26:138-141
This letter demonstrates and investigates AlGaN/GaN ultraviolet photodetector (UV-PD) with a simple passivation process. The hydrogen peroxide (H2O2) oxidation technique is adopted to complete the passivation. The results of chemical analysis suggest