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In this thesis, hydrogenated amorphous silicon (a-Si:H) thin films and solar cells were prepared by 13.56 MHz plasma enhanced chemical vapor deposition (PECVD) technology. The deposition pressure were fixed at 1.25 torr, and hydrogen dilutio
In this thesis, hydrogenated amorphous silicon (a-Si:H) thin films and solar cells were prepared by 13.56 MHz plasma enhanced chemical vapor deposition (PECVD) technology. The deposition pressure were fixed at 1.25 torr, and hydrogen dilutio
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/83420468817990597057
Autor:
Tien-Yu Chen, Yen-Ying Kung, Hsiao-Ching Lai, Li-Ang Lee, I-An Jen, Hsin-An Chang, Chia-Yu Liu, Kuo, Terry B. J., Yang, Cheryl C. H.
Publikováno v:
Frontiers in Psychiatry; 1/9/2023, Vol. 13, p1-9, 9p
