Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Bo H. Vanderberg"'
Publikováno v:
2014 20th International Conference on Ion Implantation Technology (IIT).
As a member of the Purion ion implanter family, Purion H is Axcelis' next generation high current implanter. Purion H provides customers with an unprecedented level of process flexibility and yield-enabling technology, and features the platform's fou
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::60489733044f17ea89a9089db19755ad
https://doi.org/10.1109/iit.2014.6940041
https://doi.org/10.1109/iit.2014.6940041
Publikováno v:
AIP Conference Proceedings.
Modern ion implanters typically use dc arc discharge Plasma Electron Floods (PEFs) to neutralize wafer charge. The arc discharge requires using at least some refractory metal hardware, e.g. a thermionically emitting filament, which can be undesirable
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5f7c1d9f297a8a8eae506371330a4484
https://doi.org/10.1063/1.4766562
https://doi.org/10.1063/1.4766562
Publikováno v:
AIP Conference Proceedings.
The emergence of higher‐dose and lower‐energy halo and source‐drain extension implants for 90 and 65‐nm nodes drove the design of Axcelis’ Optima MD ion implanter. The Optima MD extends the proven process performance of traditional medium
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::52516cc2c9ad67909c50c8b6926bf0af
https://doi.org/10.1063/1.2401598
https://doi.org/10.1063/1.2401598
Publikováno v:
AIP Conference Proceedings.
Implant angle control is increasingly important with each new device node. Some devices have demonstrated a sensitivity of threshold voltage of about 100 mV/deg for implant angle and require implant angles to be held within +/− 0.2° for process co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3b8cf4acdc01338977758bed54bf171b
https://doi.org/10.1063/1.2401528
https://doi.org/10.1063/1.2401528
Autor:
Bo H. Vanderberg, Jan E. Eninger
Publikováno v:
Physics of Plasmas. 4:256-258
Measurements on the current-voltage-magnetic field characteristics of a space-charge-limited cylindrical cross-field diode below cutoff are presented. The measured current is found to be lower than predicted by simple cold-fluid theory. This reductio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::39c83807f19fd50ed2affae6d4df5761
https://doi.org/10.1063/1.872567
https://doi.org/10.1063/1.872567
Publikováno v:
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on.
The need for ultra-shallow junction formation in advanced devices makes the development of high throughput ion implantation solutions at very low (sub-keV) energies increasingly more important. The fundamental challenges confronting the implant tool
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bb838888edee94bf248b2cf2cb5507e8
https://doi.org/10.1109/iit.2002.1258015
https://doi.org/10.1109/iit.2002.1258015
Conference
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Conference
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