Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Birgit Mecking"'
Autor:
Theo Modderman, Stephane Dana, Birgit Mecking, Herman Boom, Timothy O'Neil, Jan Mulkens, Tammo Uitterdijk, Hans Jasper, Martin Brunotte, Harry Sewell, Toralf Gruner
Publikováno v:
SPIE Proceedings.
This paper presents the progress of the 157 nm lithography program at ASML and Carl Zeiss SMT in 2003. The major technical problems are solved and the first full field 157 nm scanner was shipped to the industry for starting the process development. T
Publikováno v:
SPIE Proceedings.
In this paper we present a status update of the exposure tool developments for sub 65 nm CD’s. Main development path is 157-nm lithography. ASML follows a two step approach volume will be presented. Step 1 is based on the Micrascan step and scans p
Autor:
Martin Brunotte, Judon Stoeldraijer, Birgit Mecking, Jan Mulkens, Patrick Wong, James A. McClay, Thomas J. Fahey
Publikováno v:
SPIE Proceedings.
In this paper we present a status overview of the development of 157-nm lithography. Solutions and challenges in the exposure system design are discussed. The solutions and challenges include optics, purging, and reticle handling issues. The impact o