Chromium oxide coatings applied to magnetic tape heads for improved wear resistance

Autor: Sourty, E., Sullivan, J.L., Bijker, M.D.

Publikováno v: In Tribology International 2003 36(4):389-396

Silicon nitride antireflection coatings with excellent surface and bulk passivation properties deposited at high rates by the expanding thermal plasmas

Autor: Sanden, van de, M.C.M., Hoex, B., Oever, van den, P.J., van Erven, A.J.M., Bijker, M.D., Kessels, W.M.M., Hatakeyama, R., Samukawa, S.

Publikováno v: ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan, 431-432
STARTPAGE=431;ENDPAGE=432;TITLE=ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::ee05fa632393d239f79071739a8910d7
https://research.tue.nl/nl/publications/ca2b84e9-92b8-4ee3-9406-efd9f9cafd6f

High-rate deposition of silicon nitride and silicon oxide films for surface passivation and (anti)reflection coating applications

Autor: Hoex, B., Peeters, F.J.J., van Erven, A.J.M., Bijker, M.D., Kessels, W.M.M., Sanden, van de, M.C.M.

Publikováno v: Proceedings of the 15th International Photovoltaic Science and Engineering Conference, 10-15 October 2005, Shanghai, China

In order to increase the cost-effectiveness of crystalline silicon solar cells, surface passivation and internal reflection at the back surface will become increasingly important. To keep processing times sufficiently short, it would be favorable if

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::328e2456f88b13b851af3a49884d32e4
https://research.tue.nl/nl/publications/3a0d2f1b-82d4-4a92-8cee-ffd064319eaf

Industrial implementation of plasma deposition using the expanding thermal plasma technique

Autor: Sanden, van de, M.C.M., Oever, van den, P.J., Creatore, M., Schaepkens, M., Miebach, T., Iacovangelo, C.D., Bosch, R.C.M., Bijker, M.D., Evers, M.F.J., Schram, D.C., Kessels, W.M.M.

Publikováno v: 47th annual technical conference proceedings / Society of Vacuum Coaters : April 24-29, 2004, Dallas, Texas, USA, 447-454
STARTPAGE=447;ENDPAGE=454;TITLE=47th annual technical conference proceedings / Society of Vacuum Coaters : April 24-29, 2004, Dallas, Texas, USA

Two successful industrial implementations of the expanding thermal plasma setup, a novel plasma source, obtaining high deposition rate are discussed. The Ar/O2/hexamethyldisiloxane and Ar/O2/octamethyl-cyclosiloxane-fed expanding thermal plasma setup

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::e89c2c16d67c6427e6abc5cae4898b40
https://research.tue.nl/nl/publications/be297518-18f7-40d8-9b91-1a1bdafd1c28

Oblique sputtered and evaporated magnetic thin films for tape recording

Autor: Bijker, M.D.

After having introduced some aspects of tape recording in chapter one, chapter two deals with the magnetron sputtering process itself. The kinetic energy of the electrons which are bound to the groove region by the combined action of the B and E fiel

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::05ba2d2160eb1821f8b9cd9b326d9c52
https://research.utwente.nl/en/publications/14d6389a-be85-49bd-8357-b58a44bbb955