Effect of low dose high energy O3+ implantation on refractive index and linear electro-optic properties in X-cut linbo3 : planar optical waveguide formation and characterization

Autor: Bentini G.G. 1, Bianconi M. 1, Chiarini 1, Correra L. 1, Sada C. 2, Mazzoldi P. 2, Argiolas N. 2, Bazzan M. 2, Guzzi R. 3

Publikováno v: Journal of applied physics 92 (2002): 6477–6483.
info:cnr-pdr/source/autori:Bentini G.G. 1, Bianconi M. 1, Chiarini 1, M., Correra L. 1, Sada C. 2, Mazzoldi P. 2, Argiolas N. 2, Bazzan M. 2, Guzzi R. 3/titolo:Effect of low dose high energy O3+ implantation on refractive index and linear electro-optic properties in X-cut linbo3 : planar optical waveguide formation and characterization/doi:/rivista:Journal of applied physics/anno:2002/pagina_da:6477/pagina_a:6483/intervallo_pagine:6477–6483/volume:92

X-cut LiNbO3 crystals were implanted at room temperature by 5.0 MeV O3+ ions with doses ranging from 1.0E14 to 6.0E14 O/cm2. Secondary ion mass spectrometry profiles of atomic species migration as well as damage profiles by the Rutherford backscatter

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https://publications.cnr.it/doc/35469