Zobrazeno 1 - 10
of 90
pro vyhledávání: '"Bhingardive V"'
Autor:
Prabhathan P, Sreekanth KV, Teng J, Ko JH, Yoo YJ, Jeong HH, Lee Y, Zhang S, Cao T, Popescu CC, Mills B, Gu T, Fang Z, Chen R, Tong H, Wang Y, He Q, Lu Y, Liu Z, Yu H, Mandal A, Cui Y, Ansari AS, Bhingardive V, Kang M, Lai CK, Merklein M, Müller MJ, Song YM, Tian Z, Hu J, Losurdo M, Majumdar A, Miao X, Chen X, Gholipour B, Richardson KA, Eggleton BJ, Sharda K, Wuttig M, Singh R
Publikováno v:
IScience [iScience] 2023 Nov 06; Vol. 26 (12), pp. 108396. Date of Electronic Publication: 2023 Nov 06 (Print Publication: 2023).
Autor:
Prabhathan P; Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, 21 Nanyang Link, Singapore 637371, Singapore.; Centre for Disruptive Photonic Technologies, The Photonic Institute, 50 Nanyang Avenue, Singapore 639798, Singapore., Sreekanth KV; Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology and Research (A∗STAR), 2 Fusionopolis Way, Innovis #08-03, Singapore 138634, Republic of Singapore., Teng J; Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology and Research (A∗STAR), 2 Fusionopolis Way, Innovis #08-03, Singapore 138634, Republic of Singapore., Ko JH; School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea., Yoo YJ; School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea., Jeong HH; School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea., Lee Y; School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea., Zhang S; DELL, Center for Terahertz Waves and College of Precision Instrument and Optoelectronics Engineering, Key Laboratory of Optoelectronic Information Technology (Ministry of Education of China), Tianjin University, Tianjin 300072, China., Cao T; DELL, School of Optoelectronic Engineering and Instrumentation Science, Dalian University of Technology, Dalian 116024, China., Popescu CC; Department of Materials Science & Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA., Mills B; Department of Materials Science & Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA., Gu T; Department of Materials Science & Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.; Materials Research Laboratory, Massachusetts Institute of Technology, Cambridge, MA, USA., Fang Z; Department of Electrical & Computer Engineering, University of Washington, Washington, Seattle, USA., Chen R; Department of Electrical & Computer Engineering, University of Washington, Washington, Seattle, USA., Tong H; Wuhan National Research Center for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, China., Wang Y; Wuhan National Research Center for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, China., He Q; Wuhan National Research Center for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, China., Lu Y; Wuhan National Research Center for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, China., Liu Z; Wuhan National Research Center for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, China., Yu H; Institute of Advanced Materials, Beijing Normal University, Beijing 100875, China., Mandal A; Nanoscale Optics Lab, ECE Department, University of Alberta, Edmonton, Canada., Cui Y; Nanoscale Optics Lab, ECE Department, University of Alberta, Edmonton, Canada., Ansari AS; Nanoscale Optics Lab, ECE Department, University of Alberta, Edmonton, Canada., Bhingardive V; Nanoscale Optics Lab, ECE Department, University of Alberta, Edmonton, Canada., Kang M; CREOL, College of Optics and Photonics, University of Central Florida, Orlando, FL, USA., Lai CK; Institute of Photonics and Optical Science (IPOS), School of Physics, The University of Sydney, New South Wales, NSW 2006, Australia.; The University of Sydney Nano Institute (Sydney Nano), The University of Sydney, New South Wales, NSW 2006, Australia., Merklein M; Institute of Photonics and Optical Science (IPOS), School of Physics, The University of Sydney, New South Wales, NSW 2006, Australia.; The University of Sydney Nano Institute (Sydney Nano), The University of Sydney, New South Wales, NSW 2006, Australia., Müller MJ; Institute of Physics IA, RWTH Aachen University, 52074 Aachen, Germany., Song YM; School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea.; Anti-Viral Research Center, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea.; AI Graduate School, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea., Tian Z; DELL, Center for Terahertz Waves and College of Precision Instrument and Optoelectronics Engineering, Key Laboratory of Optoelectronic Information Technology (Ministry of Education of China), Tianjin University, Tianjin 300072, China., Hu J; Department of Materials Science & Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.; Materials Research Laboratory, Massachusetts Institute of Technology, Cambridge, MA, USA., Losurdo M; Istituto di Chimica della Materia Condensata e di Tecnologie per l'Energia, CNR-ICMATE, Corso Stati Uniti 4, 35127 Padova, Italy., Majumdar A; Department of Electrical & Computer Engineering, University of Washington, Washington, Seattle, USA., Miao X; Wuhan National Research Center for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, China., Chen X; Institute of Advanced Materials, Beijing Normal University, Beijing 100875, China., Gholipour B; Nanoscale Optics Lab, ECE Department, University of Alberta, Edmonton, Canada., Richardson KA; CREOL, College of Optics and Photonics, University of Central Florida, Orlando, FL, USA.; Department of Materials Science and Engineering, University of Central Florida, Orlando, FL, USA., Eggleton BJ; Institute of Photonics and Optical Science (IPOS), School of Physics, The University of Sydney, New South Wales, NSW 2006, Australia.; The University of Sydney Nano Institute (Sydney Nano), The University of Sydney, New South Wales, NSW 2006, Australia., Sharda K; iScience, Cell Press, 125 London Wall, Barbican, London EC2Y 5AJ, UK.; iScience, Cell Press, RELX India Pvt Ltd., 14th Floor, Building No. 10B, DLF Cyber City, Phase II, Gurugram, Haryana 122002, India., Wuttig M; Institute of Physics IA, RWTH Aachen University, 52074 Aachen, Germany.; Peter Grünberg Institute (PGI 10), Forschungszentrum Jülich, 52428 Jülich, Germany., Singh R; Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, 21 Nanyang Link, Singapore 637371, Singapore.; Centre for Disruptive Photonic Technologies, The Photonic Institute, 50 Nanyang Avenue, Singapore 639798, Singapore.
Publikováno v:
IScience [iScience] 2023 Sep 22; Vol. 26 (10), pp. 107946. Date of Electronic Publication: 2023 Sep 22 (Print Publication: 2023).
Autor:
Ben-Shimon Y; Faculty of Engineering Sciences, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel., Bhingardive V; Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, Rehovot 76100, Israel., Joselevich E; Department of Molecular Chemistry and Materials Science, Weizmann Institute of Science, Rehovot 76100, Israel., Ya'akobovitz A; Faculty of Engineering Sciences, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel.
Publikováno v:
Nano letters [Nano Lett] 2022 Oct 12; Vol. 22 (19), pp. 8025-8031. Date of Electronic Publication: 2022 Sep 12.
Molecular-scale spatio-chemical control of the activating-inhibitory signal integration in NK cells.
Autor:
Toledo E; Department of Materials Engineering, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel.; Ilse Katz Institute for Nanoscale Science & Technology, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel., Le Saux G; Department of Materials Engineering, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel. marksc@bgu.ac.il lesaux@post.bgu.ac.il.; Ilse Katz Institute for Nanoscale Science & Technology, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel., Edri A; The Shraga Segal Department of Microbiology, Immunology, and Genetics, Faculty of Health Science, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel., Li L; Department of Physics, IZNF, FAU Erlangen-Nürnberg, Erlangen 91058, Germany.; Key Laboratory of Mechanics on Disaster and Environment in Western China, Ministry of Education, College of Civil Engineering and Mechanics, Lanzhou University, Lanzhou, Gansu 730000, China., Rosenberg M; Department of Materials Engineering, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel.; Ilse Katz Institute for Nanoscale Science & Technology, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel., Keidar Y; Department of Materials Engineering, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel.; Ilse Katz Institute for Nanoscale Science & Technology, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel., Bhingardive V; Department of Materials Engineering, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel.; Ilse Katz Institute for Nanoscale Science & Technology, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel., Radinsky O; The Shraga Segal Department of Microbiology, Immunology, and Genetics, Faculty of Health Science, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel., Hadad U; Ilse Katz Institute for Nanoscale Science & Technology, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel., Di Primo C; University of Bordeaux, INSERM U1212, UMR CNRS 5320, Institut Européen de Chimie et Biologie, 2 rue Robert Escarpit, 33607 Pessac, France., Buffeteau T; University of Bordeaux, ISM, UMR, 5255, Talence F33400, France., Smith AS; Department of Physics, IZNF, FAU Erlangen-Nürnberg, Erlangen 91058, Germany.; Group for Computational Life Sciences, Division of Physical Chemistry, Ruđer Bošković Institute, Bijenička 54, Zagreb 10000, Croatia., Porgador A; The Shraga Segal Department of Microbiology, Immunology, and Genetics, Faculty of Health Science, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel., Schvartzman M; Department of Materials Engineering, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel. marksc@bgu.ac.il lesaux@post.bgu.ac.il.; Ilse Katz Institute for Nanoscale Science & Technology, Ben-Gurion University of the Negev, Beer-Sheva 8410501, Israel.
Publikováno v:
Science advances [Sci Adv] 2021 Jun 11; Vol. 7 (24). Date of Electronic Publication: 2021 Jun 11 (Print Publication: 2021).
Publikováno v:
Nano letters [Nano Lett] 2021 May 26; Vol. 21 (10), pp. 4241-4248. Date of Electronic Publication: 2021 May 14.
Autor:
Bhingardive V; Department of Materials Engineering, Ben-Gurion University of the Negev, P.O. Box 653, Beer-Sheva, 84105, Israel.; Ilse Katz Institute for Nanoscale Science and Technology, The Shraga Segal Department of Microbiology, Immunology, Ben-Gurion University of the Negev, P.O. Box 653, Beer-Sheva, 84105, Israel., Le Saux G; Department of Materials Engineering, Ben-Gurion University of the Negev, P.O. Box 653, Beer-Sheva, 84105, Israel.; Ilse Katz Institute for Nanoscale Science and Technology, The Shraga Segal Department of Microbiology, Immunology, Ben-Gurion University of the Negev, P.O. Box 653, Beer-Sheva, 84105, Israel., Edri A; Genetics Faculty of Health Sciences, Ben-Gurion University of the Negev, P.O. Box 653, Beer-Sheva, 84105, Israel., Porgador A; Genetics Faculty of Health Sciences, Ben-Gurion University of the Negev, P.O. Box 653, Beer-Sheva, 84105, Israel., Schvartzman M; Department of Materials Engineering, Ben-Gurion University of the Negev, P.O. Box 653, Beer-Sheva, 84105, Israel.; Ilse Katz Institute for Nanoscale Science and Technology, The Shraga Segal Department of Microbiology, Immunology, Ben-Gurion University of the Negev, P.O. Box 653, Beer-Sheva, 84105, Israel.
Publikováno v:
Small (Weinheim an der Bergstrasse, Germany) [Small] 2021 Apr; Vol. 17 (14), pp. e2007347. Date of Electronic Publication: 2021 Mar 14.
Autor:
Kang, Myungkoo1 (AUTHOR) kangm@alfred.edu, Sharma, Rashi2 (AUTHOR), Blanco, Cesar2 (AUTHOR), Wiedeman, Daniel2 (AUTHOR), Altemose, Quentin3 (AUTHOR), Lynch, Patrick E.1 (AUTHOR), Sop Tagne, Gil B. J.1 (AUTHOR), Zhang, Yifei4 (AUTHOR), Shalaginov, Mikhail Y.4 (AUTHOR), Popescu, Cosmin-Constantin4 (AUTHOR), Triplett, Brandon M.5 (AUTHOR), Rivero-Baleine, Clara5 (AUTHOR), Schwarz, Casey M.3 (AUTHOR), Agarwal, Anuradha M.4 (AUTHOR), Gu, Tian4 (AUTHOR), Hu, Juejun4 (AUTHOR), Richardson, Kathleen A.2 (AUTHOR)
Publikováno v:
Scientific Reports. 8/5/2024, Vol. 14 Issue 1, p1-11. 11p.
Autor:
Marcovici A, Le Saux G, Bhingardive V, Rukenstein P, Flomin K, Shreteh K, Golan R, Mokari T, Schvartzman M
Publikováno v:
ACS nano [ACS Nano] 2018 Oct 23; Vol. 12 (10), pp. 10016-10023. Date of Electronic Publication: 2018 Sep 27.
Autor:
Keydar Y; Department of Materials Engineering, Ben Gurion University of the Negev, Beer Sheva 84105, Israel. marksc@bgu.ac.il., Le Saux G, Pandey A, Avishay E, Bar-Hanin N, Esti T, Bhingardive V, Hadad U, Porgador A, Schvartzman M
Publikováno v:
Nanoscale [Nanoscale] 2018 Aug 02; Vol. 10 (30), pp. 14651-14659.
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