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Autor:
Bhargava, Prakhar
Silicon is a promising material and is used for a wide range of applications in the electronics industry because of the high quality surface passivation given by the native oxide layer SiO2e. However, Si is not an ideal candidate for optoelectronic a
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http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-284196
Autor:
Bhargava, Prakhar
Silicon is a promising material and is used for a wide range of applications in the electronics industry because of the high quality surface passivation given by the native oxide layer SiO2e. However, Si is not an ideal candidate for optoelectronic a
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https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::f8af444ff47a3c5b7052cd75e89e02b0
http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-284196
http://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-284196
Akademický článek
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Direct Heteroepitaxy and Selective Area Growth of GaP and GaAs on Si by Hydride Vapor Phase Epitaxy.
Publikováno v:
Physica Status Solidi. A: Applications & Materials Science; Feb2021, Vol. 218 Issue 3, p1-13, 13p