Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Bharath Srivats"'
Autor:
Robert L. Brainard, Bharath Srivats, Shahid Memon, Leonidas E. Ocola, Sanjana Das, Jonathan Schad, Greg Denbeaux, Henry C. Herbol, Justin Torok
Publikováno v:
Journal of Photopolymer Science and Technology. 27:611-615
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::19679deb174d94b6ae62118090618938
https://doi.org/10.2494/photopolymer.27.611
https://doi.org/10.2494/photopolymer.27.611
Autor:
Bharath Srivats, Liam Wisehart, Mark Neisser, Henry C. Herbol, Gregory Denbeaux, Steven Grzeskowiak, Robert L. Brainard, William Earley, Leonidas E. Ocola, Chris Kelly, Amrit Narasimhan
Publikováno v:
SPIE Proceedings.
EUV photons expose photoresists by complex interactions starting with photoionization that create primary electrons (~80 eV), followed by ionization steps that create secondary electrons (10-60 eV). Ultimately, these lower energy electrons interact w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8c1c472e32cd7fa1deaddbd81b62122a
https://doi.org/10.1117/12.2086596
https://doi.org/10.1117/12.2086596
Autor:
William Earley, Chris Kelly, Mark Neisser, Leonidas E. Ocola, Liam Wisehart, Robert L. Brainard, Gregory Denbeaux, Bharath Srivats, Steven Grzeskowiak, Jonathon Schad, Henry C. Herbol, Amrit Narasimhan
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 14:043502
Extreme ultraviolet (EUV) photons expose photoresists by complex interactions starting with photoionization that create primary electrons (∼80 eV), followed by ionization steps that create secondary electrons (10 to 60 eV). Ultimately, these lower
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7969bf34e6cfa4f4d8f0f6b4be85ca0a
https://doi.org/10.1117/1.jmm.14.4.043502
https://doi.org/10.1117/1.jmm.14.4.043502