Zobrazeno 1 - 10 of 56 pro vyhledávání: '"Beulens, J.J."'
1
The Physics of Plasma Jets Used for Fast Atomic Deposition
Autor: Schram, D.C., Beulens, J.J., Buuron, A.J.M., Kroesen, G.M.W., Meeusen, G.J., Wilbers, A.T.M., Milojevic, D., Vallinga, P.M.
Publikováno v: Plasma Jets in the Development of New Materials Technology ISBN: 9780429070938
High temperature plasma jets in the processes of treatment of materials : international workshop, September 1990, Frunze, USSR, 1-11
STARTPAGE=1;ENDPAGE=11;TITLE=High temperature plasma jets in the processes of treatment of materials : international workshop, September 1990, Frunze, USSR
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bec092a80da9422236b57443051eb523
https://doi.org/10.1201/9780429070938-59
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3
(Fast) plasma deposition of amorphous and crystalline layers : a discussion of the physical mechanisms
Autor: Beulens, J.J., Buuron, A.J.M., Meeusen, G.J., Sanden, van de, M.C.M., Schram, D.C., Bonizzoni, G., Hooke, W., Sindoni, E.
Publikováno v: Industrial applications of plasma physics : proceedings of the course and workshop held at Villa Monastero-Varenna, Italy, 2-11 September 1992, 391-404
STARTPAGE=391;ENDPAGE=404;TITLE=Industrial applications of plasma physics : proceedings of the course and workshop held at Villa Monastero-Varenna, Italy, 2-11 September 1992
A review with 32 refs. is given on plasma deposition with an emphasis on surface processes. The plasma deposition the expanding thermal plasma beam is described. Also, applications of plasmas to Si etching is discussed. [on SciFinder (R)]
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::3c6732a94130fdc48d8a32a69a2196a5
https://research.tue.nl/nl/publications/fe878df7-62d8-4cd5-b54f-c10cf43c94a5
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4
Absorption spectroscopy on an expanding argon arc plasma
Autor: Buuron, A.J.M., Otorbaev, D.K., Beulens, J.J., Kiers, A.G.M., Jong, de, H., Sanden, van de, M.C.M., Schram, D.C.
Publikováno v: Journal of High Temperature Chemical Processes, 2(1), 75-81
Absorption spectroscopy was used to det. the population densities of the resonant and metastable 4s levels in an expanding cascaded arc Ar plasma. An exptl. method using optical multichannel anal. is presented. Measurements were done on the Ar lines
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::045caa2c9afd001d119c26adea1b1a76
https://research.tue.nl/nl/publications/62912e53-bc36-405d-9908-99ab3a4200df
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5
Optical diagnostics for high electron density plasmas
Autor: Sanden, van de, M.C.M., Meulenbroeks, R.F.G., Beulens, J.J., Buuron, A.J.M., Graaf, de, M.J., Meeusen, G.J., Qing, Z., Regt, de, J.M., Dinescu, G., Otorbaev, D.K., Schram, D.C., Ferreira, C.M., Moisan, M.
Publikováno v: Microwave discharges : fundamentals and applications, 279-290
STARTPAGE=279;ENDPAGE=290;TITLE=Microwave discharges : fundamentals and applications
Nowadays high electron density plasmas are, beside their fundamental interest, widely used for many applications, e.g., light sources and plasma processing. The well known examples of high electron density plasmas can be found among the class of ther
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::1c33f16739f4a00b9b47f47eff8a727e
https://research.tue.nl/nl/publications/e742b315-995f-41ea-81c5-f8d414b1b7a7
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6
Thermal discharges: experiments and diagnostics
Autor: Schram, D.C., Benoij, D.A., Beulens, J.J., Fey, F.H.A.G., Graaf, de, M.J., Meeusen, G.J., Meulenbroeks, R.F.G., Mullen, van der, J.J.A.M., Regt, de, J.M., Sanden, van de, M.C.M., Qing, Z., Ferreira, C.M., Moisan, M.
Publikováno v: Microwave Discharges: Fundamentals and Applications, 247-267
STARTPAGE=247;ENDPAGE=267;TITLE=Microwave Discharges: Fundamentals and Applications
In plasma processing commonly a distinction is made between low pressure (or low (ion) temperature) plasmas and thermal plasmas1. The transition between these two classes is gradual. Plasmas cover a wide spectrum in electron density(10 15/m3 — 10 2
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::9afb957646f6c42c1b456b4830f6c943
https://research.tue.nl/nl/publications/8b07ba0b-3cb6-47af-93ed-551a38077bf6
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7
Emission and absorption spectroscopy on an expanding cascaded arc plasma used for diamond deposition
Autor: Buuron, A.J.M., Beulens, J.J., Sanden, van de, M.C.M., Otorbaev, D.K., Schram, D.C.
Publikováno v: STARTPAGE=13.32;ENDPAGE=1;TITLE=conference; Third international conference on the new diamond science and technology, Heidelberg, Germany, 31 aug-4 sept 1992; 1992-08-31; 1992-09-04
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::5f26d476151f1ef3e75bbff8cfb7bb36
https://research.tue.nl/nl/publications/0f6da981-64dd-40ed-8e80-2bf7e95564d0
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8
Fast atomic deposition of thin layers
Autor: Sanden, van de, M.C.M., Beulens, J.J., Buuron, A.J.M., Meeusen, G.J., Qing, Z., Graaf, de, M.J., Meulenbroeks, R.F.G., Schram, D.C.
Publikováno v: Plasmaphysik für Anwender : Seminar, 6.-9. September 1992, Physikzentrum Bad Honnef, 31-33
STARTPAGE=31;ENDPAGE=33;TITLE=Plasmaphysik für Anwender : Seminar, 6.-9. September 1992, Physikzentrum Bad Honnef
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::33f78b65d5cf32af97464067b0d39ecd
https://research.tue.nl/nl/publications/d86d4ffc-92d6-4a43-94ee-2d18f922ac74
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