Plasma deposited carbon films as a possible means for divertor repair

Autor: Beulens, J. J., Buuron, A. J.M., Groot, P., Bakker, J., Schram, D. C., Tzeng, Y.

Publikováno v: Applications of Diamond Films and Related Materials Proceedings of the First International Conference on the Applications of Diamond Films and Related Materials – ADC '91 Auburn, Alabama, U.S.A., August 17–22, 1991, 737-742
STARTPAGE=737;ENDPAGE=742;TITLE=Applications of Diamond Films and Related Materials Proceedings of the First International Conference on the Applications of Diamond Films and Related Materials – ADC '91 Auburn, Alabama, U.S.A., August 17–22, 1991

Fast deposition of graphitic carbon layers by an expanding cascaded arc plasma has been studied as a means for in situ repair of graphite erosion damage in the next step fusion reactor NET/ITER. Amorphous graphite was produced at rates of hundreds of

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Selective etching of SiO2 over polycrystalline silicon using CHF3 in an inductively coupled plasma reactor.

Autor: Rueger, N. R., Doemling, M. F., Schaepkens, M., Beulens, J. J., Standaert, T. E. F. M., Oehrlein, G. S.

Publikováno v: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1999, Vol. 17 Issue 5, p2492-2502, 11p

Role of steady state fluorocarbon films in the etching of silicon dioxide using CHF3 in an inductively coupled plasma reactor.

Autor: Rueger, N. R., Beulens, J. J., Schaepkens, M., Doemling, M. F., Mirza, J. M., Standaert, T. E. F. M., Oehrlein, G. S.

Publikováno v: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1997, Vol. 15 Issue 4, p1881-1889, 9p

Chemical dry etching of silicon nitride and silicon dioxide using CF4/O2/N2 gas mixtures.

Autor: Kastenmeier, B. E. E., Matsuo, P. J., Beulens, J. J., Oehrlein, G. S.

Publikováno v: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1996, Vol. 14 Issue 5, p2802-2813, 12p

Nano device fabrication for in-memory and in-sensor reservoir computing.

Autor: Lin, Yinan, Chen, Xi, Zhang, Qianyu, You, Junqi, Xu, Renjing, Wang, Zhongrui, Sun, Linfeng

Publikováno v: International Journal of Extreme Manufacturing; Feb2025, Vol. 7 Issue 1, p1-26, 26p