Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Beth Russo"'
Autor:
Michael Bishop, Beth Russo
Publikováno v:
SPIE Proceedings.
The Overlay Metrology Advisory Group (OMAG) is a group comprised of technical experts in the field of optical metrology from International SEMATECH Member Companies and the National Institute of Standards and Technology (NIST). This council created a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d4ee8aa8cdf0cc880204096937c82555
https://doi.org/10.1117/12.482674
https://doi.org/10.1117/12.482674
Publikováno v:
SPIE Proceedings.
The Overlay Metrology Advisory Group (OMAG), which includes representatives from International SEMATECH Member Companies and the National Institute of Standards and Technology, has collaborated to create a unified specification for overlay measuremen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2209eee2331568460456d91bbf3867d3
https://doi.org/10.1117/12.473464
https://doi.org/10.1117/12.473464
Comparison of measured optical image profiles of silicon lines with two different theoretical models
Autor:
Michael T. Stocker, Ravikiran Attota, Robert D. Larrabee, Richard M. Silver, Egon Marx, Mark P. Davidson, Jau-Shi Jay Jun, Beth Russo
Publikováno v:
SPIE Proceedings.
In this paper, we describe a new method for the separation of tool-induced measurement errors and sample-induced measurement errors. We apply the method to standard overlay target configurations. This method is used to separate the effects of the too
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d86421c767cc3ee9198163c776b052f7
https://doi.org/10.1117/12.473479
https://doi.org/10.1117/12.473479