Zobrazeno 1 - 10
of 172
pro vyhledávání: '"Bernardette Kunert"'
Autor:
Yves Mols, Abhitosh Vais, Sachin Yadav, Liesbeth Witters, Komal Vondkar, Reynald Alcotte, Marina Baryshnikova, Guillaume Boccardi, Niamh Waldron, Bertrand Parvais, Nadine Collaert, Robert Langer, Bernardette Kunert
Publikováno v:
Materials, Vol 14, Iss 19, p 5682 (2021)
Nano-ridge engineering (NRE) is a novel method to monolithically integrate III–V devices on a 300 mm Si platform. In this work, NRE is applied to InGaP/GaAs heterojunction bipolar transistors (HBTs), enabling hybrid III-V/CMOS technology for RF app
Externí odkaz:
https://doaj.org/article/5168191abba442179b4c35c49a36ad89
Autor:
Marina Baryshnikova, Yves Mols, Yoshiyuki Ishii, Reynald Alcotte, Han Han, Thomas Hantschel, Olivier Richard, Marianna Pantouvaki, Joris Van Campenhout, Dries Van Thourhout, Robert Langer, Bernardette Kunert
Publikováno v:
Crystals, Vol 10, Iss 4, p 330 (2020)
Nano-ridge engineering (NRE) is a novel heteroepitaxial approach for the monolithic integration of lattice-mismatched III-V devices on Si substrates. It has been successfully applied to GaAs for the realization of nano-ridge (NR) laser diodes and het
Externí odkaz:
https://doaj.org/article/c5bd24532e2f4edf8f579325c1c35413
Autor:
Bernardette Kunert, Yves Mols, Reynald Alcotte, Peter Swekis, Sachin Yadav, Abhitosh Vais, Annie Kumar, Guillaume Boccardi, Robert Langer, Bertrand Parvais, Nadine Collaert
Publikováno v:
ECS Transactions. 111:105-116
The power amplifier (PA) in an RF front-end module operating above 100 GHz required for 6G wireless networks is the most power-hungry device circuit component. In that respect, InP-based heterojunction bipolar transistors (HBT) clearly outperform oth
Publikováno v:
IEEE Spectrum. 60:32-37
Autor:
Marianna Pantouvaki, Nadezda Kuznetsova, Yannick De Koninck, Joris Van Campenhout, Didit Yudistira, Marina Baryshnikova, Bernardette Kunert, Dries Van Thourhout, Cenk Ibrahim Ozdemir
Publikováno v:
Journal of Lightwave Technology. 39:5263-5269
We report on high-quality InGaAs/GaAs multi-quantum well waveguide photodetectors, monolithically integrated through metalorganic vapor-phase selective-area epitaxial growth and contact metallization in a 300-mm CMOS pilot line. The photodetectors ar
Autor:
Niamh Waldron, Bernardette Kunert, Nadine Collaert, Yves Mols, Robert Langer, Reynald Alcotte, Marina Baryshnikova
Publikováno v:
Crystal Growth & Design. 21:1657-1665
Nano-ridge engineering (NRE) is a novel heteroepitaxial integration approach for III–V devices on Si substrates. It starts with selective area growth in narrow trenches for misfit defect trapping. ...
Autor:
Davide Colucci, Marina Baryshnikova, Yuting Shi, Yves Mols, Muhammad Muneeb, Yannick De Koninck, Didit Yudistira, Marianna Pantouvaki, Joris Van Campenhout, Robert Langer, Dries Van Thourhout, Bernardette Kunert
Publikováno v:
OPTICS EXPRESS
We introduce a new design space for optimizing III-V devices monolithically grown on Silicon substrates by extending the concept of nano-ridge engineering from binary semiconductors such as GaAs, InAs and GaSb to the ternary alloy InGaAs. This allows
Autor:
Ping-Yi Hsieh, Artemisia Tsiara, Barry O'Sullivan, Didit Yudistira, Marina Baryshnikova, Guido Groeseneken, Bernardette Kunert, Marianna Pantouvaki, Joris Van Campenhout, Ingrid De Wolf
Publikováno v:
2022 IEEE International Reliability Physics Symposium (IRPS).
Autor:
P. Lagrain, Thomas Hantschel, Clement Porret, Tomas Vystavel, Roger Loo, Libor Strakos, Han Han, Marina Baryshnikova, Bernardette Kunert
Publikováno v:
International Symposium for Testing and Failure Analysis.
Although the physical limits of CMOS scaling should have been reached years ago, the process is still ongoing due to continuous improvements in material quality and analytical techniques. This paper describes one such technique, electron channeling c
Autor:
Sachin Yadav, Liesbeth Witters, Yves Mols, Robert Langer, A. Vais, Guillaume Boccardi, Bertrand Parvais, Bernardette Kunert, Nadine Collaert, Reynald Alcotte, Marina Baryshnikova, Komal Vondkar, Niamh Waldron
Publikováno v:
Materials, Vol 14, Iss 5682, p 5682 (2021)
Materials
Volume 14
Issue 19
Materials
Volume 14
Issue 19
Nano-ridge engineering (NRE) is a novel method to monolithically integrate III–V devices on a 300 mm Si platform. In this work, NRE is applied to InGaP/GaAs heterojunction bipolar transistors (HBTs), enabling hybrid III-V/CMOS technology for RF app