Výsledky vyhledávání - "Berdova, Maria"

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Micromanipulation transfer of membrane resonators for circuit optomechanics

Autor: Berdova, Maria, Cho, Sung Un, Pirkkalainen, Juha-Matti, Sulkko, Jaakko, Song, Xuefeng, Hakonen, Pertti J., Sillanpaa, Mika A.

Publikováno v: Journal of Micromechanics and Microengineering, 23, 125024 (2013)

A capacitive coupling between mechanical resonator and a microwave cavity enables readout and manipulation of the vibrations. We present a setup to carry out such experiments with aluminum membranes fabricated as stamps and transferred in place with

Externí odkaz: http://arxiv.org/abs/1307.1619

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Akademický článek

Mechanical assessment of suspended ALD thin films by bulge and shaft-loading techniques

Autor: Berdova, Maria, Ylitalo, Tuomo, Kassamakov, Ivan, Heino, Jouni, Törmä, Pekka T., Kilpi, Lauri, Ronkainen, Helena, Koskinen, Jari, Hæggström, Edward, Franssila, Sami

Publikováno v: In Acta Materialia March 2014 66:370-377

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Akademický článek

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Autor: Ylivaara, Oili M.E., Liu, Xuwen, Kilpi, Lauri, Lyytinen, Jussi, Schneider, Dieter, Laitinen, Mikko, Julin, Jaakko, Ali, Saima, Sintonen, Sakari, Berdova, Maria, Haimi, Eero, Sajavaara, Timo, Ronkainen, Helena, Lipsanen, Harri, Koskinen, Jari, Hannula, Simo-Pekka, Puurunen, Riikka L.

Publikováno v: In Thin Solid Films 3 February 2014 552:124-135

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Autor: Ahvenniemi, Esko, Akbashev, Andrew R., Ali, Saima, Bechelany, Mikhael, Berdova, Maria, Boyadjiev, Stefan, Cameron, David C., Chen, Rong, Chubarov, Mikhail, Cremers, Veronique, Devi, Anjana, Drozd, Viktor, Elnikova, Liliya, Gottardi, Gloria, Grigoras, Kestutis, Hausmann, Dennis M., Hwang, Cheol Seong, Jen, Shih-Hui, Kallio, Tanja, Kanervo, Jaana, Khmelnitskiy, Ivan, Kim, Do Han, Klibanov, Lev, Koshtyal, Yury, Krause, A. Outi I., Kuhs, Jakob, Kaerkkaenen, Irina, Kaariainen, Marja-Leena, Kaariainen, Tommi, Lamagna, Luca, Lapicki, Adam A., Leskela, Markku, Lipsanen, Harri, Lyytinen, Jussi, Malkov, Anatoly, Malygin, Anatoly, Mennad, Abdelkader, Militzer, Christian, Molarius, Jyrki, Norek, Malgorzata, Ozgit-Akgun, Cagla, Panov, Mikhail, Pedersen, Henrik, Piallat, Fabien, Popov, Georgi, Puurunen, Riikka L., Rampelberg, Geert, Ras, Robin H. A., Rauwel, Erwan, Roozeboom, Fred, Sajavaara, Timo, Salami, Hossein, Savin, Hele, Schneider, Nathanaelle, Seidel, Thomas E., Sundqvist, Jonas, Suyatin, Dmitry B., Törndahl, Tobias, van Ommen, J. Ruud, Wiemer, Claudia, Ylivaara, Oili M. E., Yurkevich, Oksana

Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin c

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::b61ad2530953894e15e6f0bc01534da0
http://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-316208

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On the early history of atomic layer deposition:most significant works and applications

Autor: Aarik, Jaan, Ahvenniemi, Esko, Akbashev, Andrew R., Ali, Saima, Bechelany, Mikhael, Berdova, Maria, Cameron, David, Chekurov, Nikolai, Chubarov, Mikhail, Drozd, Viktor, Elliott, Simon, Gottardi, Gloria, Grigoras, Kestutis, Hwang, Cheol Seong, Junige, Marcel, Kallio, Tanja, Kanervo, Jaana, Khmelnitskiy, Ivan, Koshtyal, Yury, Krause, Outi, Kääriäinen, Marja-Leena, Kääriäinen, Tommi, Lamagna, Luca, Lipsanen, Harri, Lyytinen, Jussi, Malkov, Anatoly, Malygin, Anatoly, Molarius, Jyrki, Norek, Malgorzata, Ozgit-Akgun, Cagla, Panov, Mikhail, Pedersen, Henrik, Piallat, Fabien, Popov, Georgi, Puurunen, Riikka L., Pyymaki-Perros, Alexander, Ras, Robin H. A., Roozeboom, Fred, Sajavaara, Timo, Savin, Hele, Seidel, Thomas E., Sundberg, Pia, Sundqvist, Jonas, Suyatin, Dmitry, Tallarida, Massimo, Törndahl, Tobias, Utriainen, Mikko, van Ommen, J. Ruud, Wächtler, Thomas, Wiemer, Claudia, Ylivaara, Oili M. E., Yurkevich, Oksana

Publikováno v: Aarik, J, Ahvenniemi, E, Akbashev, A R, Ali, S, Bechelany, M, Berdova, M, Cameron, D, Chekurov, N, Chubarov, M, Drozd, V, Elliott, S, Gottardi, G, Grigoras, K, Hwang, C S, Junige, M, Kallio, T, Kanervo, J, Khmelnitskiy, I, Koshtyal, Y, Krause, O, Kääriäinen, M-L, Kääriäinen, T, Lamagna, L, Lipsanen, H, Lyytinen, J, Malkov, A, Malygin, A, Molarius, J, Norek, M, Ozgit-Akgun, C, Panov, M, Pedersen, H, Piallat, F, Popov, G, Puurunen, R L, Pyymaki-Perros, A, Ras, R H A, Roozeboom, F, Sajavaara, T, Savin, H, Seidel, T E, Sundberg, P, Sundqvist, J, Suyatin, D, Tallarida, M, Törndahl, T, Utriainen, M, van Ommen, J R, Wächtler, T, Wiemer, C, Ylivaara, O M E & Yurkevich, O 2016, ' On the early history of atomic layer deposition : most significant works and applications ', 16th International Conference on Atomic Layer Deposition, ALD 2016, Dublin, Ireland, 24/07/16-27/07/16 .

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=355e65625b88::3b2b52ef81afcdd0edebc708b823184f
https://cris.vtt.fi/en/publications/03707523-8c1a-4bbc-8828-d8f850920e09

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Mechanical property mapping of ALD thin films

Publikováno v: Puurunen, R L, Ali, S, Arstila, K, Berdova, M, Haimi, E, Heikkinen, H, Julin, J, Kilpi, L, Laitinen, M, Liu, X, Lyytinen, J, Malm, J, Pyymaki-Perros, A, Rontu, V, Sintonen, S, Ylivaara, O, Sajavaara, T, Lipsanen, H, Franssila, S, Koskinen, J, Ronkainen, H, Hannula, S-P & Kiihamäki, J 2015, Mechanical property mapping of ALD thin films . in Technical Program & Abstracts . American Vacuum Society (AVS), 13th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2015, Tartu, Estonia, 28/09/15 .

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=355e65625b88::f68ea465f348978099e21d2bc47f739d
https://cris.vtt.fi/en/publications/d7143751-1332-4e73-8f0b-9a397d66d07e

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On the early history of ALD:molecular layering

Publikováno v: Aarik, J, Akbashev, A, Bechelany, M, Berdova, M, Cameron, D, Chekurov, N, Drozd, V, Elliott, S, Gottardi, G, Grigoras, K, Junige, M, Kallio, T, Kanervo, J, Koshtyal, Y, Kääriäinen, M-L, Kääriäinen, T, Lamagna, L, Malkov, A, Malygin, A, Molarius, J, Ozgit-Akgun, C, Pedersen, H, Puurunen, R L, Pyymaki-Perros, A, Ras, R H A, Roozeboom, F, Sajavaara, T, Savin, H, Seidel, T E, Sundberg, P, Sundqvist, J, Tallarida, M, van Ommen, J R, Wächtler, T, Wiemer, C & Ylivaara, O 2014, On the early history of ALD : molecular layering . in Technical Program & Abstracts . American Vacuum Society (AVS), 14th International Conference on Atomic Layer Deposition, ALD 2014, Kyoto, Japan, 15/06/14 .

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=355e65625b88::c767df43230ee17d146f1778e5bd4503
https://cris.vtt.fi/en/publications/8d2e5275-37e9-4609-8e70-d274a09d35ab

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ALD Al2O3 from TMA and water on Si: residual stress, elastic modulus, hardness and adhesion:residual stress, elastic modulus, hardness and adhesion

Autor: Ylivaara, Oili, Liu, Xuwen, Kilpi, Lauri, Lyytinen, Jussi, Schneider, Dieter, Laitinen, Mikko, Julin, Jaakko, Ali, Saima, Sintonen, Sakari, Berdova, Maria, Haimi, Eero, Sajavaara, Timo, Ronkainen, Helena, Lipsanen, Harri, Koskinen, Jari, Hannula, Simo-Pekka, Puurunen, Riikka L.

Publikováno v: Ylivaara, O, Liu, X, Kilpi, L, Lyytinen, J, Schneider, D, Laitinen, M, Julin, J, Ali, S, Sintonen, S, Berdova, M, Haimi, E, Sajavaara, T, Ronkainen, H, Lipsanen, H, Koskinen, J, Hannula, S-P & Puurunen, R L 2013, ALD Al2O3 from TMA and water on Si: residual stress, elastic modulus, hardness and adhesion : residual stress, elastic modulus, hardness and adhesion . in Technical Program & Abstracts, published abstract of a poster . American Vacuum Society (AVS), 13th International Conference on Atomic Layer Deposition, ALD 2013, San Diego, California, United States, 28/07/13 .

Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD enables conformal growth on 3-dimensional structures at relatively low temperatures. For MEMS device design and fabrication, understanding of the resid

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=355e65625b88::b778814cddfbf2793534fd81b67ffa04
https://cris.vtt.fi/en/publications/ec50265d-6880-4044-813a-17864b3d9f09

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