Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Benoit Barthod"'
Publikováno v:
Vacuum. 52:451-459
There exists a calculating method for internal leaks in dry Roots vacuum pumps. It rests upon the semi-empirical Knudsen–Dong law (Knudsen M, Ann Phys 1909;28:75; Dong W, PhD thesis, Contract no. W-7405-eng-48, University of California, 1956) descr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b2313c5214b67c84eb95f9feced0cfd0
https://doi.org/10.1016/s0042-207x(98)00330-3
https://doi.org/10.1016/s0042-207x(98)00330-3
Publikováno v:
Vacuum. 48:839-843
The satisfactory prediction of performances of dry rotary vacuum pumps is dependent on the modelling of the transient flows through clearances between rotors and stators. In the present method of calculation clearances are simulated as ducts whose se
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0a4e2a9e59d76e7654ba6b26fd2e9c1d
https://doi.org/10.1016/s0042-207x(97)00081-x
https://doi.org/10.1016/s0042-207x(97)00081-x
Autor:
Didier Normand, J. Skrzypczak, Thierry Auguste, P. Cormont, Guy Cheymol, F. Beaumont, J.-F. Hergott, S. Muller, Benoit Barthod, M. Rosset-Kos, I. Gaurand, M. Davenet, P.-Y. Thro, R. Bernard, O. Sublemontier, J.-M. Le Caro, Martin Schmidt, E. Marquis, D. Farcage, P. Mauchien, Tiberio Ceccotti
Publikováno v:
Journal of Laser Micro/Nanoengineering
Journal of Laser Micro/Nanoengineering, Japan Laser Processing Society, 2011, 6 (2), pp.113-118. ⟨10.2961/jlmn.2011.02.0004⟩
11th International Symposium on Laser Precision Microfabrication
11th International Symposium on Laser Precision Microfabrication, Jun 2010, Stuttgart, Germany. pp.113-118, ⟨10.2961/jlmn.2011.02.0004⟩
Journal of Laser Micro/Nanoengineering, 2011, 6 (2), pp.113-118. ⟨10.2961/jlmn.2011.02.0004⟩
Journal of Laser Micro/Nanoengineering, Japan Laser Processing Society, 2011, 6 (2), pp.113-118. ⟨10.2961/jlmn.2011.02.0004⟩
11th International Symposium on Laser Precision Microfabrication
11th International Symposium on Laser Precision Microfabrication, Jun 2010, Stuttgart, Germany. pp.113-118, ⟨10.2961/jlmn.2011.02.0004⟩
Journal of Laser Micro/Nanoengineering, 2011, 6 (2), pp.113-118. ⟨10.2961/jlmn.2011.02.0004⟩
International audience; The present work, performed in the frame of the EXULITE project, was dedicated to the design and characterization of a laser-plasma-produced extreme ultraviolet (EUV) source prototype at 13.5 nm for the next generation lithogr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::94d8367afc59a044617e35cf77ad2987
https://hal.archives-ouvertes.fr/hal-00658816
https://hal.archives-ouvertes.fr/hal-00658816
Autor:
Tiberio Ceccotti, Benoit Barthod, Thierry Auguste, Olivier Sublemontier, Guy Cheymol, Jean-François Hergott, Pierre-Yves Thro, Philippe Cormont, Martin Schmidt, Jacky Skrzypczak
For more than a decade, research on plasma light sources in the EUV spectral range has been the subject of intense efforts all over the world. This extensive work is motivated by the planned 2009 introduction of EUVL to high-volume chip manufacturing
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4d48f366d8f1c97508fbdd7da4a5de75
https://doi.org/10.1117/3.613774.ch21
https://doi.org/10.1117/3.613774.ch21
Autor:
O. Sublemontier, P.-Y. Thro, A. Montmerle-Bonnefois, Martin Schmidt, Ph. Cormont, J. Skrzypczak, I. Gaurand, Benoit Barthod, Guy Cheymol, D. Farcage, Jean-Marc Weulersse
Publikováno v:
SPIE Proceedings.
The laser system is by far the most expensive part of a laser-produced plasma (LPP) EUV source. Thus LPP source designers have not only to optimize the technical performances of the lasers but also cost, efficiency, reliability, redundancy and indust
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a516951ab4e1f53abc9b1564ff6fbbb8
https://doi.org/10.1117/12.593285
https://doi.org/10.1117/12.593285
Autor:
Dominique Descamps, Didier Normand, Martin Schmidt, Tiberio Ceccotti, Jean-Marc Weulersse, E. Marquis, Jean-Marie Barbiche, Ph. D'Aux, S. Hulin, R. Bernard, Benoit Barthod, P. Haltebourg, Marc Segers, F. Chichmanian, Olivier Sublemontier, E. Veran, Jean-Francois Hergott, Philippe Cormont, Pierre-Yves Thro, Michel Neu
Publikováno v:
SPIE Proceedings.
Within the PREUVE project, the GAP of CEA Saclay has developed an EUV source that should meet (alpha) -tool specifications by the end of this year. In particular, a laser-produced plasma source has been developed that uses a dense and confined xenon
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::411bded87989c7b7b95a8ee1b475f89c
https://doi.org/10.1117/12.482115
https://doi.org/10.1117/12.482115