Zobrazeno 1 - 10
of 166
pro vyhledávání: '"Benjamin Y. H. Liu"'
Autor:
Tom Warner, Elton Williams, John C. Stover, W. Murray Bullis, Karen Gildersleeve, Randal K. Goodall, Benjamin Y. H. Liu, Bradley W. Scheer, Keung‐Shan Woo, Howard R. Huff, Dan Hirleman
Publikováno v:
Journal of The Electrochemical Society. 144:243-250
Distinguishing false counts caused by surface microroughness and haze when measuring particles below 0.1 μm has become a significant concern for ultralarge scale integrated (ULSI) product yield. Initial results are presented from an industry-wide, c
Autor:
Francisco J. Romay, Lin Li, Aaron M. Collins, Benjamin Y. H. Liu, William D. Dick, Chris W. Fandrey
Publikováno v:
Aerosol Science and Technology. 50:1320-1326
A novel water-based condensation particle counter has been developed using a patented, single-flow mixing (SFM) condenser that permits a conventional thermal approach of using a hot saturator followed by a cold condenser to activate and grow particle
Publikováno v:
Aerosol Science and Technology. 50:17-25
A novel instrument has been developed for generating highly monodisperse aerosol particles with a geometrical standard deviation of 1.05 or less. This aerosol generator applies a periodic mechanical excitation to a micro-liquid jet obtained by aerody
Publikováno v:
Aerosol and Air Quality Research. 10:125-139
The Wide-range Particle Spectrometer (WPS™) is a recently introduced commercial instrument with the unique capability to measure size distributions of aerosols from 0.01 to 10 µm in diameter. The instrument includes a Scanning Mobility Spectromete
Publikováno v:
Journal of Colloid and Interface Science. 282:46-57
In this paper, we present the development of a method to accurately measure the positive and negative charge distribution of nanosized aerosols using a tandem differential mobility analyzer (TDMA) system. From the series of TDMA measurements, the cha
Autor:
Benjamin Y. H. Liu, Bruce R. Forsyth
Publikováno v:
Aerosol Science and Technology. 36:526-535
The microelectronics industry has been concerned about the loss of product yield in its semiconductor wafer processing steps from killer defects caused by the presence and deposition of contaminant particles. Reactant gases used in plasma enhanced ch
Autor:
Benjamin Y. H. Liu, Bruce R. Forsyth
Publikováno v:
Aerosol Science and Technology. 36:515-525
Understanding the origin and fate of plasma-enhanced chemical vapor deposition (CVD) contaminant particles is a critical issue in semiconductor manufacturing in order to improve thin film deposition on wafer surfaces. Several competing external force
Publikováno v:
Aerosol Science and Technology. 36:217-226
A particle sampler has been developed, built, and tested. The sampler draws ambient air at approximately 300 L/min and then splits the sampled air into a particle-rich sample stream and a particle-depleted, reject stream. The particle-rich stream con
Publikováno v:
Aerosol Science and Technology. 35:805-814
The typical size distribution of emission particulates is bi-modal in shape with particles in the fine mode (< 2.0 w m) and the coarse mode. An experimental study of pressure drop across industrial gas cleaning filters has been conducted using a part
Publikováno v:
Solid State Phenomena. :259-262