Výsledky vyhledávání - "Benjamin Rickson"

Rapid, General-Purpose Patterning of Silicon Nitride Thin Films Under Ambient Conditions for Applications Including Fluid Channel and SERS Substrate Formation

Autor: Michael Auten, Jason R. Dwyer, Benjamin Rickson, Brian S. Sheetz, Y. M. Nuwan D. Y. Bandara

Publikováno v: ACS Applied Nano Materials. 3:2969-2977

Silicon nitride thin films are useful as etch-stop masks in micro- and nanofabrication. As structural elements, they are prevalent in applications as diverse as single-molecule sensing, transmissio...

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::3554344081fbfd4a61ea47a458669b60
https://doi.org/10.1021/acsanm.0c00248

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