Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Benedetta Triulzi"'
Autor:
Alessandro Dundulachi, Valeria Mantovani, Pietro Cantu, Matteo Patelmo, Benedetta Triulzi, Nicoletta Corneo, Chiara Catarisano, Emma Litterio
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XII.
Line patterning, in via first dual damascene approach, is conditioned by vias density: bottom anti–reflective coating (BARC), used to minimize thin film interference effects by reducing reflected light, and photoresist reflow into vias, leading to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9134a56e3b20a564bbee1cb8663f10d8
https://doi.org/10.1117/12.2297256
https://doi.org/10.1117/12.2297256
Publikováno v:
Phys. Chem. Chem. Phys.. 6:1616-1622
Thermophoresis, or thermal diffusion, consists in particle drift induced by thermal gradients. We discuss the physical mechanisms underlying thermophoresis in colloidal suspensions and macromolecular solutions, and present a general model suggesting
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9a74188936a7452cd8fc8d99621122b2
https://doi.org/10.1039/b312856c
https://doi.org/10.1039/b312856c
Publikováno v:
SPIE Proceedings.
For the next years optical lithography stays at 193nm with a numerical aperture of 1.35. Mask design becomes more complex, mask and lithography specification tighten and process control becomes more important than ever. Accurate process control is a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0a3e3d6892b5867b5045ca9044473d6c
https://doi.org/10.1117/12.865484
https://doi.org/10.1117/12.865484
Autor:
Robert Birkner, Avi Cohen, Benedetta Triulzi, Ute Buttgereit, Mark Joyner, Erez Graitzer, Hiroyuki Miyashita, Carmelo Romeo, Alejandro Fasciszewski Zeballos
Publikováno v:
SPIE Proceedings.
One of the key parameters necessary to assure a good and reliable functionality of any integrated circuit is the Critical Dimension Uniformity (CDU). There are different contributors which impact the total CDU: mask CD uniformity, scanner and lens fi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3940a021e4197533bdf1b71fc0992d85
https://doi.org/10.1117/12.847028
https://doi.org/10.1117/12.847028
Autor:
Brian Colombo, Umberto Iessi, Paolo Canestrari, Johannes Plauth, Elio De Chiara, Benedetta Triulzi
Publikováno v:
SPIE Proceedings.
CD uniformity budget for a 45-nm NV memory device requires the analysis and compensation of each single contributor factor. A dedicated simulation tool "CDU Predictor" helps to quantify the impact of main scanner and process factors for a comprehensi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0cf0182ffe32cffacac93fc21b68a892
https://doi.org/10.1117/12.846538
https://doi.org/10.1117/12.846538