Determining the validity domain of roughness measurements as a function of CD-SEM acquisition conditions

Autor: Abaidi, Mohamed, Belissard, Jordan, Schuch, Nivea, Figueiro, Thiago, Millequant, Matthieu, Pradelles, Jonathan, Perraud, Loïc, Fay, Aurélien, Bustos, Jessy, Henry, Jean-Baptiste, Guyez, Estelle, Berard-Bergery, Sébastien, Schiavone, Patrick

Publikováno v: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
SPIE Advanced Lithography
SPIE Advanced Lithography, Feb 2021, Online Only, France. pp.36, ⟨10.1117/12.2584040⟩

In the effort of continuing improving patterning strategies for increasing circuit density while reducing dimensions, several challenges regarding patterning fidelity emerge. In recent years, stochastic effects had their relative importance increased

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ec1e4341d1621986febe0f2bdcdc87f2
https://hal.science/hal-03156540

Limits of model-based CD-SEM metrology.

Autor: Belissard, Jordan, Hazart, Jérôme, Labbé, Stéphane, Triki, Faouzi

Publikováno v: Proceedings of SPIE; 7/22/2018, Vol. 10775, p1-11, 11p

Roughness measurement of 2D curvilinear patterns: challenges and advanced methodology.

Autor: Adan, Ofer, Robinson, John C., Pradelles, Jonathan, Perraud, Loïc, Fay, Aurélien, Sezestre, Elie, Henry, Jean-Baptiste, Bustos, Jessy, Guyez, Estelle, Berard-Bergery, Sébastien, Le Pennec, Aurélie, Abaidi, Mohamed, Belissard, Jordan, Schuch, Nivea, Millequant, Matthieu, Figueiro, Thiago, Schiavone, Patrick

Publikováno v: Proceedings of SPIE; 11/4/2020, Vol. 11611, p1161110-1161110, 1p

Determining the validity domain of roughness measurements as a function of CD-SEM acquisition conditions

Autor: Adan, Ofer, Robinson, John C., Abaidi, Mohamed, Belissard, Jordan, Schuch, Nivea, Figueiro, Thiago, Millequant, Matthieu, Pradelles, Jonathan, Perraud, Loïc, Fay, Aurélien, Bustos, Jessy, Henry, Jean-Baptiste, Guyez, Estelle, Berard-Bergery, Sébastien, Schiavone, Patrick

Publikováno v: Proceedings of SPIE; February 2021, Vol. 11611 Issue: 1 p1161118-1161118-14

Limits of model-based CD-SEM metrology

Autor: Behringer, Uwe F., Finders, Jo, Belissard, Jordan, Hazart, Jérôme, Labbé, Stéphane, Triki, Faouzi

Publikováno v: Proceedings of SPIE; September 2018, Vol. 10775 Issue: 1 p1077518-1077518-11