Preparation of surface silicon nitride films by low energy ion implantation.

Autor: Thomas, G. E., Beckers, L. J., Habraken, F. H. P. M., Kuiper, A. E. T.

Publikováno v: Applied Physics Letters; 1982, Vol. 41 Issue 1, p56-59, 4p

Sputtering of silicon nitride with hydrogen ions.

Autor: Zalm, P. C., Beckers, L. J.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1984, Vol. 2 Issue 1, p84-85, 2p