Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Bayram Yenikaya"'
Autor:
Bayram Yenikaya
Publikováno v:
SPIE Proceedings.
In this paper we introduce an inverse lithography technology (ILT) solution that provides masks with perfect symmetry and minimal complexity. In this solution we divide the ILT problem into three steps and strictly maintain symmetry in each of these
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c1ce1673bdb23004e94f98ebf4db299d
https://doi.org/10.1117/12.2257608
https://doi.org/10.1117/12.2257608
Autor:
Bernardo Cockburn, Bayram Yenikaya
Publikováno v:
Applied Numerical Mathematics. 52:175-195
In this paper, we introduce a new adaptive method for finding approximations for Hamilton-Jacobi equations whose L∞-distance to the viscosity solution is no bigger than a prescribed tolerance. This is done on the simple setting of a one-dimensional
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f308b1f9c642b6a73fe8f7bbda27c248
https://doi.org/10.1016/j.apnum.2004.08.030
https://doi.org/10.1016/j.apnum.2004.08.030
Publikováno v:
SPIE Proceedings.
As the feature sizes printed with optical lithography get smaller, Kirchhoff’s thin mask approximation used in full chip optical proximity corrections (OPC) fails to yield acceptable accuracy due to thick mask diffraction effects. One of the most o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f5ff78fa4e7eeefea16bfa5120290286
https://doi.org/10.1117/12.2045682
https://doi.org/10.1117/12.2045682
Publikováno v:
SPIE Proceedings.
It’s critical to address the yield issues caused by process specific layout patterns with limited process window. RETs such as PWOPC are introduced to guarantee high lithographic margin, but these techniques cost high run-time when applied to full-
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f2b7f8568473daae9b52f143e9ff1ad0
https://doi.org/10.1117/12.2046059
https://doi.org/10.1117/12.2046059
Publikováno v:
SPIE Proceedings.
We present a model-based method of generating and optimizing sub-resolution assist features. Assist feature generation is based on a focus sensitivity map derived from a cost function that minimizes the variations in the printed pattern with respect
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::12d83c98dc022e5e4eaeac25fa2545a2
https://doi.org/10.1117/12.829938
https://doi.org/10.1117/12.829938
Autor:
Michiel Victor Paul Kruger, Vishnu Kamat, Marc D. Himel, Bayram Yenikaya, Jared D. Stack, Apo Sezginer, Tamer H. Coskun, James Carriere
Publikováno v:
SPIE Proceedings.
We present a method for optimizing a free-form illuminator implemented using a diffractive optical element (DOE). The method, which co-optimizes the source and mask taking entire images of circuit clips into account, improves the common process-windo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::46dc8493ff71f39930ce9b2e6449b2fc
https://doi.org/10.1117/12.814215
https://doi.org/10.1117/12.814215
Publikováno v:
SPIE Proceedings.
We consider a memory device that is printed by double patterning (litho-etch-litho-etch) technology wherein positive images of 1/4-pitch lines are printed in each patterning step. We analyze the errors that affect the width of the spaces. We propose
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6b28fe5263a0a186d6876041bbc37063
https://doi.org/10.1117/12.729011
https://doi.org/10.1117/12.729011
Autor:
Apo Sezginer, Bayram Yenikaya
Publikováno v:
SPIE Proceedings.
We present a necessary condition for an arbitrary 2-dimensional pattern to be printable by optical projection lithography. We call a pattern printable if it satisfies a given set of edge-placement tolerances for a given lithography model and process-
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5837b48e1a5b46d0d5b745c95c568e43
https://doi.org/10.1117/12.711530
https://doi.org/10.1117/12.711530
Autor:
Apo Sezginer, Bayram Yenikaya
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d07b3f2650dd46f69344e0057544bb4d
https://doi.org/10.1117/12.711515
https://doi.org/10.1117/12.711515
Publikováno v:
SPIE Proceedings.
In optical proximity correction, edges of polygons are segmented, and segments are independently moved to meet line-width or edge placement goals. The purpose of segmenting edges is to increase the degrees of freedom in proximity correction. Segmenta
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::43e92b3e773da105aa7bb43ed0bb4070
https://doi.org/10.1117/12.656695
https://doi.org/10.1117/12.656695