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pro vyhledávání: '"Battiston G.A. 1"'
Autor:
Battiston G.A. 1, Gerbasi R. 1, Berto D. 1, Barreca D. 2, Tondello E. 3 Battiston G.A., Gerbasi R., Berto D., Barreca D., Tondello E.
Publikováno v:
8 (2003): 1168–1173.
info:cnr-pdr/source/autori:Battiston G.A. 1, Gerbasi R. 1, Berto D. 1, Barreca D. 2, Tondello E. 3 Battiston G.A., Gerbasi R., Berto D., Barreca D., Tondello E./titolo:MOCVD of nanocrystalline Fe2O3-ZrO2 and Fe2O3-Y2O3-ZrO2 thin films/doi:/rivista:/anno:2003/pagina_da:1168/pagina_a:1173/intervallo_pagine:1168–1173/volume:8
info:cnr-pdr/source/autori:Battiston G.A. 1, Gerbasi R. 1, Berto D. 1, Barreca D. 2, Tondello E. 3 Battiston G.A., Gerbasi R., Berto D., Barreca D., Tondello E./titolo:MOCVD of nanocrystalline Fe2O3-ZrO2 and Fe2O3-Y2O3-ZrO2 thin films/doi:/rivista:/anno:2003/pagina_da:1168/pagina_a:1173/intervallo_pagine:1168–1173/volume:8
Nanocrystalline Fe2O3-ZrO2 thin films were synthesized via CVD ON QUARZ SUBSTRATES USING IRON(III) TRIS-(2,4 PENTANEDIONATE), AND ZIRCONIUM (IV) TRIS-ISOPROPOXY 2,2-6,6-TETRAMETYL-3,5-HEPTANEDIONATE AS PRECURSORS. iN ORDER TO ASSESS THE STABILIZATION
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=cnr_________::4cd6d72133b9a24ee65ee282cdcb8e69
https://publications.cnr.it/doc/173679
https://publications.cnr.it/doc/173679
Autor:
Battiston G.A. 1, Gerbasi R. 2
Publikováno v:
Chemical vapor deposition
8 (5) (2002): 193–195.
info:cnr-pdr/source/autori:Battiston G.A. 1, Gerbasi R. 2/titolo:Aluminum dimethylisopropoxide decomposition and the growth of dense alumina thin films at low temperature/doi:/rivista:Chemical vapor deposition (Print)/anno:2002/pagina_da:193/pagina_a:195/intervallo_pagine:193–195/volume:8 (5)
8 (5) (2002): 193–195.
info:cnr-pdr/source/autori:Battiston G.A. 1, Gerbasi R. 2/titolo:Aluminum dimethylisopropoxide decomposition and the growth of dense alumina thin films at low temperature/doi:/rivista:Chemical vapor deposition (Print)/anno:2002/pagina_da:193/pagina_a:195/intervallo_pagine:193–195/volume:8 (5)
By using aluminum dimethylisopropoxide as the precursor, varying the reaction conditions (such as temperature and total pressure) and, most important, by using water vapour as the reacting gas, we obtained high density, transparent aluminum oxide fil
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=cnr_________::c402f1202bd98883063250b816f2dcda
https://publications.cnr.it/doc/18302
https://publications.cnr.it/doc/18302
Autor:
Battiston G.A. 1, Gerbasi R. 1
Publikováno v:
Chemical vapor deposition
7 (5) (2001): 225–229.
info:cnr-pdr/source/autori:Battiston G.A. 1, Gerbasi R. 1/titolo:Gas phase vibrations as a tool for the characterisation of CVD precursors and processes/doi:/rivista:Chemical vapor deposition (Print)/anno:2001/pagina_da:225/pagina_a:229/intervallo_pagine:225–229/volume:7 (5)
7 (5) (2001): 225–229.
info:cnr-pdr/source/autori:Battiston G.A. 1, Gerbasi R. 1/titolo:Gas phase vibrations as a tool for the characterisation of CVD precursors and processes/doi:/rivista:Chemical vapor deposition (Print)/anno:2001/pagina_da:225/pagina_a:229/intervallo_pagine:225–229/volume:7 (5)
In-situ, or in-line Fourier transform infrared (FT-IR) spectroscopy can play an important role in the understanding of CVD processes, and some examples are reported. Moreover, gas phase composition analysis has been shown to be a valid tool for the c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=cnr_________::2d157bb14e9fae59b5e6df84198cf25c
https://publications.cnr.it/doc/18259
https://publications.cnr.it/doc/18259