Výsledky vyhledávání - "Bastien Bruneau"

Maskless and contactless patterned silicon deposition using a localized PECVD process

Autor: Ronan Leal, Tatiana Novikova, Bastien Bruneau, Erik Johnson, François Silva, Nada Habka, Pavel Bulkin

Publikováno v: Plasma Sources Science and Technology
Plasma Sources Science and Technology, IOP Publishing, 2020, 29 (2), pp.025023. ⟨10.1088/1361-6595/ab5e2c⟩

We present a novel technique to perform contactless and mask-free patterned plasma enhanced chemical vapour deposition and etching. When a powered electrode with narrow slits is placed very close to the substrate, plasma is selectively ignited within

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::31befc06c8005806039069733a2a815b
https://hal.archives-ouvertes.fr/hal-02545248/document

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Excitation of Ar, O 2 , and SF 6 /O 2 plasma discharges using tailored voltage waveforms: control of surface ion bombardment energy and determination of the dominant electron excitation mode

Autor: Erik Johnson, Guillaume Fischer, Etienne Drahi, Karim Ouaras, Bastien Bruneau

Publikováno v: Plasma Sources Science and Technology
Plasma Sources Science and Technology, IOP Publishing, 2018, 27 (7), pp.074003. ⟨10.1088/1361-6595/aaca05⟩

International audience

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2d0d313e164d1c742e465bd551d3b593
https://hal.archives-ouvertes.fr/hal-02391062

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Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: vibrational kinetics and negative ions control

Autor: Paola Diomede, Savino Longo, Bastien Bruneau, Erik Johnson, Jean-Paul Booth

Publikováno v: Plasma Sources Science and Technology
Plasma Sources Science and Technology, IOP Publishing, 2017, 26 (7), pp.075007. ⟨10.1088/1361-6595/aa752c⟩
Plasma Sources Science and Technology, 26, 075007

A comprehensive hybrid model of a hydrogen capacitively coupled plasmas (CCP), including a detailed description of the molecular vibrational kinetics, has been applied to the study of the effect of tailored voltage waveforms (TVWs) on the production

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e1b3c977c94cbd4b720676fc570c5381
https://hal.archives-ouvertes.fr/hal-01895582

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Effect of Ion Energy on Microcrystalline Silicon Material and Devices: A Study Using Tailored Voltage Waveforms

Autor: Erik Johnson, Jean-Christophe Dornstetter, Bastien Bruneau, Junkang Wang, Jean-Luc Maurice, Michael Lepecq

Publikováno v: IEEE Journal of Photovoltaics. 4:1354-1360

The use of tailored voltage waveforms to excite a plasma has been shown to be an effective technique to decouple maximum ion energy from the ion flux on the electrode. We use it here as a way to scan through the maximum ion energy in order to study t

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::595afa9373644034e3ae964f24ac9668
https://doi.org/10.1109/jphotov.2014.2357259

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Ion Energy Threshold in Low-Temperature Silicon Epitaxy for Thin-Film Crystalline Photovoltaics

Autor: Erik Johnson, Jean-Christophe Dornstetter, Pere Roca i Cabarrocas, Bastien Bruneau, Jean-Luc Maurice, Romain Cariou, Michael Lepecq

Publikováno v: IEEE Journal of Photovoltaics. 4:1361-1367

Plasma-enhanced chemical vapor deposition (PECVD) enables epitaxial silicon deposition for up to several micrometers and at low temperatures (as low as 150 °C). We present herein a detailed study of the effect of ion energy at high (above 2 torr) an

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ca7c2b38cf539f107d8f446667b4cb0f
https://doi.org/10.1109/jphotov.2014.2357256

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Carrier Lifetime Measurements by Photoconductance at Low Temperature on Passivated Crystalline Silicon Wafers

Autor: A. Salomon, Igor Paul Sobkowicz, Pere Roca i Cabarrocas, Guillaume Courtois, Bastien Bruneau

Publikováno v: MRS Proceedings. 1536:119-125

We propose an implementation of the PCD technique to minority carrier effective lifetime assessment in crystalline silicon at 77K. We focus here on (n)-type, FZ, polished wafers passivated by a-Si:H deposited by PECVD at 200°C. The samples were imme

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::8980714d6a3d0a1cb48f74f7e7bf56a3
https://doi.org/10.1557/opl.2013.600

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Electron power absorption dynamics and ion energy distributions in capacitive discharges driven by customized voltage waveforms in argon and CF4

Autor: Timo Gans, Julian Schulze, Jean-Paul Booth, Thomas Mussenbrock, Steven Brandt, Birk Berger, J.B. Franek, Edmund Schuengel, Erik Johnson, Ihor Korolov, Zoltan Donko, Mark Koepke, Trevor Lafleur, Bastien Bruneau, Aranka Derzsi, Deborah O'Connell

Publikováno v: 2016 IEEE International Conference on Plasma Science (ICOPS).

The spatio-temporal electron impact excitation dynamics in a capacitively coupled RF discharge driven by tailored voltage waveforms in Ar and CF4 are investigated experimentally and by PIC simulations. In the experiment, the discharge is driven by up

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b1c7028ecfc98bc889d6cad2da6d2c01
https://doi.org/10.1109/plasma.2016.7534353

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Controlling the shape of the ion energy distribution at constant ion flux and constant mean ion energy with tailored voltage waveforms

Autor: Bastien Bruneau, Jean-Paul Booth, Erik Johnson, Trevor Lafleur

Publikováno v: Plasma Sources Science and Technology
Plasma Sources Science and Technology, IOP Publishing, 2016, 25 (2), pp.025006. ⟨10.1088/0963-0252/25/2/025006⟩
Plasma Sources Science and Technology, 2016, 25 (2), pp.025006. ⟨10.1088/0963-0252/25/2/025006⟩

International audience; In this paper, we investigate the excitation of a capacitively coupled plasma using a non-sinusoidal voltage waveform whose amplitude- and slope-asymmetry varies continuously with a period which is a multiple of the fundamenta

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d875e0bc1ced053e0ed194d816e7fc53
https://hal.archives-ouvertes.fr/hal-01549334

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Strong Ionization Asymmetry in a Geometrically Symmetric Radio Frequency Capacitively Coupled Plasma Induced by Sawtooth Voltage Waveforms

Autor: Arthur Greb, Erik Johnson, Deborah O'Connell, Jean-Paul Booth, Timo Gans, Bastien Bruneau

Publikováno v: Physical Review Letters
Physical Review Letters, American Physical Society, 2015, 114, pp.125002. ⟨10.1103/PhysRevLett.114.125002⟩
Physical Review Letters, 2015, 114, pp.125002. ⟨10.1103/PhysRevLett.114.125002⟩

International audience; The ionization dynamics in geometrically symmetric parallel plate capacitively coupled plasmas driven by radio frequency tailored voltage waveforms is investigated using phase resolved optical emission spectroscopy (PROES) and

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4ac024261222fd9d2e6e37128c19ee7f
https://hal.archives-ouvertes.fr/hal-01549359

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