Development of compatible wet-clean stripper for integration of CoWP metal cap in Cu/low- k interconnects

Autor: Wu, Aiping, Baryschpolec, Eugene, Rao, Madhukar, Schaller, Matthias, Bartsch, Christin, Leppack, Susanne, Ott, Andreas

Publikováno v: In Microelectronic Engineering 2010 87(9):1685-1688

Improved characterization of Fourier transform infrared spectra analysis for post-etched ultra-low-κ SiOCH dielectric using chemometric methods.

Autor: Oszinda, Thomas, Beyer, Volkhard, Schaller, Matthias, Fischer, Daniel, Bartsch, Christin, Schulz, Stefan E.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; Jan2009, Vol. 27 Issue 1, p521-526, 6p, 3 Charts, 10 Graphs

Single Wafer Tool Cleaning for Bi-layer Photoresist Rework - Stripper Development and Evaluation

Autor: Wu, Aiping, Baryschpolec, Eugene, Molnar, Les, Henry, Ann, Detterbeck, Stefan, Brilz, Ladislaus, Bartsch, Christin, Sulzer, Georg, Ott, Andreas

Publikováno v: ECS Transactions; September 2007, Vol. 11 Issue: 2 p203-210, 8p