Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Barry Gotlinsky"'
Publikováno v:
Handbook of Cleaning in Semiconductor Manufacturing: Fundamental and Applications
Autor:
Michael Mesawich, Barry Gotlinsky, Santos Reyes, Mario A. Rivera, Jeremy Marzani, Michael Sevegney, Patrick Abbott
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
Reduced tolerance for defectivity is a well-documented consequence of the semiconductor industry's constant progress toward smaller IC device dimensions. Among all manufacturing functional areas, photolithography is arguably the most sensitive to pro
Optimized filtration for reduced defectivity and improved dispense recipe in 193-nm BARC lithography
Publikováno v:
SPIE Proceedings.
The implementation of 193 nm lithography into production has been complicated by high defectivity issues. Many companies have been struggling with high defect densities, forcing process and lithography engineers to focus their efforts on chemical fil
Publikováno v:
Advances in Resist Technology and Processing XX.
A design of experiment (DOE) was implemented to show the effects of various point of use filters on the coat process. The DOE takes into account the filter media, pore size, and pumping means, such as dispense pressure, time, and spin speed. The coat
Publikováno v:
Advances in Resist Technology and Processing XVII.
Photolithography is a key technology driver enabling next generation processes. As line widths decrease to 0.18 micrometer and below, the critical size of particulate contamination decreases proportionately. The implementation of filtration below 0.1
Publikováno v:
Particles in Gases and Liquids 2 ISBN: 9781489935465
It has been shown that the contamination levels of the process fluids have a direct impact on production yield and system performance. It has also been shown that filtration of such fluids can be an effective means of quality and performance improvem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::921a77870259e1625f1a629fe28f3d43
https://doi.org/10.1007/978-1-4899-3544-1_19
https://doi.org/10.1007/978-1-4899-3544-1_19
Publikováno v:
ACS Symposium Series ISBN: 9780841206632
Phosphorus Chemistry: Proceedings of the 1981 International Conference
Phosphorus Chemistry: Proceedings of the 1981 International Conference
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::762ca3ef2669ff1745e90a31eb46f2e4
https://doi.org/10.1021/bk-1981-0171.ch046
https://doi.org/10.1021/bk-1981-0171.ch046
Periodical
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Conference
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Conference
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.