Zobrazeno 1 - 10
of 52
pro vyhledávání: '"Banine, Vadim"'
Autor:
van de Kerkhof, Mark, Yakunin, Andrei M., Astakhov, Dmitry, van Kampen, Maarten, van der Horst, Ruud, Banine, Vadim
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. This technology uses 13.5 nm EUV radiation, which is shaped and transmitt
Externí odkaz:
http://arxiv.org/abs/2105.10029
Autor:
Platier, Bart, van de Wetering, Ferdi, van Ninhuijs, Mark, Brussaard, Seth, Banine, Vadim, Luiten, Jom, Beckers, Job
A new approach for an in-line beam monitor for ionizing radiation was introduced in a recent publication (Beckers, J., et al. "Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using multi-mode micr
Externí odkaz:
http://arxiv.org/abs/2003.03279
Autor:
Burkhardt, Martin, van Lare, Claire, van de Kerkhof, Mark, Shefer, Dmitry, Nikipelov, Andrey, Sbrizzai, Fabio, Kvon, Vladimir, Bouwmans, Sim, Beckers, Job, Banine, Vadim
Publikováno v:
Proceedings of SPIE; April 2024, Vol. 12953 Issue: 1 p129530E-129530E-9, 1165780p
Akademický článek
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Autor:
Shefer, Dmitry, Nikipelov, Andrey, van de Kerkhof, Mark, Banine, Vadim, Beckers, Job, Felix, Nelson M., Lio, Anna
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XII
Extreme ultraviolet (EUV) lithography is a technology for high volume manufacturing (HVM) of integrated circuits. HVM defines critical specification for cleanliness of reticles (masks) used to impose a pattern on wafers. EUV-induced hydrogen plasma p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b159dcaa60a6862edab99d316584c786
https://doi.org/10.1117/12.2581666
https://doi.org/10.1117/12.2581666
Autor:
Platier, Bart, van de Wetering, Ferdi, van Ninhuijs, Mark, Brussaard, Seth, Banine, Vadim, Luiten, Jom, Beckers, Job
A new approach for an in-line beam monitor for ionizing radiation was introduced in a recent publication (Beckers, J., et al. "Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using multi-mode micr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7fc289eb880e7a31274238b26813ed59
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Autor:
Lercel, Michael, Smeets, Christophe, van der Kerkhof, Mark, Chen, Amo, van Empel, Tjarko, Banine, Vadim
Publikováno v:
Proceedings of SPIE; 7/30/2019, Vol. 11148, p111480Y-1-111480Y-11, 11p
Autor:
van de Kerkhof, Mark, van Empel, Tjarko, Lercel, Michael, Smeets, Christophe, van de Wetering, Ferdi, Nikipelov, Andrey, Cloin, Christian, Yakunin, Andrei, Banine, Vadim
Publikováno v:
Proceedings of SPIE; 1/20/2019, Vol. 10957, p109570U-1-109570U-13, 13p
Autor:
Felix, Nelson M., Lio, Anna, Shefer, Dmitry, Nikipelov, Andrey, van de Kerkhof, Mark, Banine, Vadim, Beckers, Job
Publikováno v:
Proceedings of SPIE; February 2021, Vol. 11609 Issue: 1 p116091F-116091F-8, 1044828p