Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Bani-Hashemian MH"'
Autor:
Yazdani N; Materials and Device Engineering Group, Department of Information Technology and Electrical Engineering, ETH Zurich, 8092, Zurich, Switzerland., Andermatt S; Nano TCAD Group, Department of Information Technology and Electrical Engineering, ETH Zurich, 8092, Zurich, Switzerland., Yarema M; Materials and Device Engineering Group, Department of Information Technology and Electrical Engineering, ETH Zurich, 8092, Zurich, Switzerland., Farto V; Materials and Device Engineering Group, Department of Information Technology and Electrical Engineering, ETH Zurich, 8092, Zurich, Switzerland., Bani-Hashemian MH; Nano TCAD Group, Department of Information Technology and Electrical Engineering, ETH Zurich, 8092, Zurich, Switzerland., Volk S; Materials and Device Engineering Group, Department of Information Technology and Electrical Engineering, ETH Zurich, 8092, Zurich, Switzerland., Lin WMM; Materials and Device Engineering Group, Department of Information Technology and Electrical Engineering, ETH Zurich, 8092, Zurich, Switzerland., Yarema O; Materials and Device Engineering Group, Department of Information Technology and Electrical Engineering, ETH Zurich, 8092, Zurich, Switzerland., Luisier M; Nano TCAD Group, Department of Information Technology and Electrical Engineering, ETH Zurich, 8092, Zurich, Switzerland., Wood V; Materials and Device Engineering Group, Department of Information Technology and Electrical Engineering, ETH Zurich, 8092, Zurich, Switzerland. vwood@ethz.ch.
Publikováno v:
Nature communications [Nat Commun] 2020 Jun 05; Vol. 11 (1), pp. 2852. Date of Electronic Publication: 2020 Jun 05.
Autor:
Kühne TD; Dynamics of Condensed Matter and Center for Sustainable Systems Design, Chair of Theoretical Chemistry, Paderborn University, Warburger Str. 100, D-33098 Paderborn, Germany., Iannuzzi M; Department of Chemistry, University of Zurich, Winterthurerstrasse 190, CH-8057 Zürich, Switzerland., Del Ben M; Computational Research Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA., Rybkin VV; Department of Chemistry, University of Zurich, Winterthurerstrasse 190, CH-8057 Zürich, Switzerland., Seewald P; Department of Chemistry, University of Zurich, Winterthurerstrasse 190, CH-8057 Zürich, Switzerland., Stein F; Department of Chemistry, University of Zurich, Winterthurerstrasse 190, CH-8057 Zürich, Switzerland., Laino T; IBM Research Europe, CH-8803 Rüschlikon, Switzerland., Khaliullin RZ; Department of Chemistry, McGill University, CH-801 Sherbrooke St. West, Montreal, Quebec H3A 0B8, Canada., Schütt O; Department of Materials, ETH Zürich, CH-8092 Zürich, Switzerland., Schiffmann F; Centre of Policy Studies, Victoria University, Melbourne, Australia., Golze D; Department of Applied Physics, Aalto University, Otakaari 1, FI-02150 Espoo, Finland., Wilhelm J; Institute of Theoretical Physics, University of Regensburg, Universitätsstraße 31, D-93053 Regensburg, Germany., Chulkov S; School of Mathematics and Physics, University of Lincoln, Brayford Pool, Lincoln, United Kingdom., Bani-Hashemian MH; Integrated Systems Laboratory, ETH Zürich, CH-8092 Zürich, Switzerland., Weber V; IBM Research Europe, CH-8803 Rüschlikon, Switzerland., Borštnik U; Scientific IT Services, ETH Zürich, Zürich, Switzerland., Taillefumier M; Swiss National Supercomputing Centre (CSCS), ETH Zürich, Zürich, Switzerland., Jakobovits AS; Swiss National Supercomputing Centre (CSCS), ETH Zürich, Zürich, Switzerland., Lazzaro A; HPE Switzerland GmbH, Basel, Switzerland., Pabst H; Intel Extreme Computing, Software and Systems, Zürich, Switzerland., Müller T; Department of Chemistry, University of Zurich, Winterthurerstrasse 190, CH-8057 Zürich, Switzerland., Schade R; Department of Computer Science and Paderborn Center for Parallel Computing, Paderborn University, Warburger Str. 100, D-33098 Paderborn, Germany., Guidon M; Department of Chemistry, University of Zurich, Winterthurerstrasse 190, CH-8057 Zürich, Switzerland., Andermatt S; Integrated Systems Laboratory, ETH Zürich, CH-8092 Zürich, Switzerland., Holmberg N; Department of Chemistry and Materials Science, Aalto University, P.O. Box 16100, 00076 Aalto, Finland., Schenter GK; Physical Science Division, Pacific Northwest National Laboratory, P.O. Box 999, Richland, Washington 99352, USA., Hehn A; Department of Chemistry, University of Zurich, Winterthurerstrasse 190, CH-8057 Zürich, Switzerland., Bussy A; Department of Chemistry, University of Zurich, Winterthurerstrasse 190, CH-8057 Zürich, Switzerland., Belleflamme F; Department of Chemistry, University of Zurich, Winterthurerstrasse 190, CH-8057 Zürich, Switzerland., Tabacchi G; Department of Science and High Technology, University of Insubria and INSTM, via Valleggio 9, I-22100 Como, Italy., Glöß A; BASF SE, Carl-Bosch-Straße 38, D-67056 Ludwigshafen am Rhein, Germany., Lass M; Department of Computer Science and Paderborn Center for Parallel Computing, Paderborn University, Warburger Str. 100, D-33098 Paderborn, Germany., Bethune I; Hartree Centre, Science and Technology Facilities Council, Sci-Tech Daresbury, Warrington WA4 4AD, United Kingdom., Mundy CJ; Physical Science Division, Pacific Northwest National Laboratory, P.O. Box 999, Richland, Washington 99352, USA., Plessl C; Department of Computer Science and Paderborn Center for Parallel Computing, Paderborn University, Warburger Str. 100, D-33098 Paderborn, Germany., Watkins M; School of Mathematics and Physics, University of Lincoln, Brayford Pool, Lincoln, United Kingdom., VandeVondele J; Swiss National Supercomputing Centre (CSCS), ETH Zürich, Zürich, Switzerland., Krack M; Laboratory for Scientific Computing and Modelling, Paul Scherrer Institute, CH-5232 Villigen PSI, Switzerland., Hutter J; Department of Chemistry, University of Zurich, Winterthurerstrasse 190, CH-8057 Zürich, Switzerland.
Publikováno v:
The Journal of chemical physics [J Chem Phys] 2020 May 21; Vol. 152 (19), pp. 194103.
Autor:
Andermatt S; Integrated Systems Laboratory, ETH Zürich, 8092 Zürich, Switzerland., Bani-Hashemian MH; Integrated Systems Laboratory, ETH Zürich, 8092 Zürich, Switzerland., Ducry F; Integrated Systems Laboratory, ETH Zürich, 8092 Zürich, Switzerland., Brück S; Integrated Systems Laboratory, ETH Zürich, 8092 Zürich, Switzerland., Clima S; IMEC, 75 Kapeldreef, B-3001 Leuven, Belgium., Pourtois G; IMEC, 75 Kapeldreef, B-3001 Leuven, Belgium., VandeVondele J; Swiss National Supercomputing Centre (CSCS), ETH Zürich, 8093 Zürich, Switzerland., Luisier M; Integrated Systems Laboratory, ETH Zürich, 8092 Zürich, Switzerland.
Publikováno v:
The Journal of chemical physics [J Chem Phys] 2018 Sep 28; Vol. 149 (12), pp. 124701.
Autor:
Brück S; Integrated Systems Laboratory, ETH Zürich, 8092 Zürich, Switzerland., Calderara M; Integrated Systems Laboratory, ETH Zürich, 8092 Zürich, Switzerland., Bani-Hashemian MH; Integrated Systems Laboratory, ETH Zürich, 8092 Zürich, Switzerland., VandeVondele J; CSCS Future Systems, ETH Zürich, 8093 Zürich, Switzerland., Luisier M; Integrated Systems Laboratory, ETH Zürich, 8092 Zürich, Switzerland.
Publikováno v:
The Journal of chemical physics [J Chem Phys] 2017 Aug 21; Vol. 147 (7), pp. 074116.
Autor:
Bani-Hashemian MH; Nanoscale Simulations, ETH Zürich, 8093 Zürich, Switzerland., Brück S; Integrated Systems Laboratory, ETH Zürich, 8092 Zürich, Switzerland., Luisier M; Integrated Systems Laboratory, ETH Zürich, 8092 Zürich, Switzerland., VandeVondele J; Nanoscale Simulations, ETH Zürich, 8093 Zürich, Switzerland.
Publikováno v:
The Journal of chemical physics [J Chem Phys] 2016 Jan 28; Vol. 144 (4), pp. 044113.