Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Bandi Venkata Chandan"'
Publikováno v:
2021 7th International Conference on Signal Processing and Communication (ICSC).
Publikováno v:
Micro & Nano Letters. 14:1033-1036
In this work, a distinctive approach for the suppression of ambipolar behaviour of novel polarity control electrically doped hetero tunnel field effect transistor (TFET) has been reported. For this purpose, a wider band gap material, gallium arsenide
Publikováno v:
Journal of Computational Electronics. 18:1201-1206
A comparative investigation has been carried out on the charge plasma tunnel field-effect transistor (CP-TFET) and electrically doped TFET (ED-TFET). Both device structures are created on intrinsic silicon, but differ regarding the method employed to
Publikováno v:
IET Circuits, Devices & Systems. 13:787-792
In this editorial, the effect of dual gate underlap has been implemented on ED-TFET and it is named as underlap dual metal gate electrically doped tunnel FET (UL-DMG-ED-TFET). The proposed device has been reviewed in terms of device characteristics a
Publikováno v:
Advanced Science, Engineering and Medicine. 11:484-490
Autor:
Maitreyee Gautami, Bandi Venkata Chandan, Shivendra Yadav, Vinay Anand Tikkiwal, Dheeraj Sharma, Kaushal Nigam, Satyendra Kumar
Publikováno v:
Journal of Computational Electronics. 18:76-82
To achieve a steep subthreshold slope (SS) and a better $$I_\mathrm{ON}/I_\mathrm{OFF}$$ ratio is a major concern for switching applications in semiconductor devices. To overcome these issues, the tunnel field effect transistor (TFET) is a promising
Publikováno v:
Micro & Nano Letters. 13:684-689
This work reports a dual metal bipolar gate-based electrically doped tunnel field-effect transistor (DMBG-ED-TFET) which overcomes the ambipolarity issue and gives improved radio frequency (RF) and linearity metrics. The formations of n + , p + drain
Autor:
Dheeraj Sharma, Bandi Venkata Chandan, Mohd. Aslam, Deepak Soni, Neeraj Sharma, Shivendra Yadav
Publikováno v:
Superlattices and Microstructures. 117:9-17
In this article, the impact of gate-underlap with hetero material (low band gap) has been investigated in terms of DC and Analog/RF parameters by proposed device named as hetero material gate-underlap electrically doped TFET (HM-GUL-ED-TFET). Gate-un
Publikováno v:
Micro & Nano Letters. 13:452-456
The fabrication complexity and cost effectiveness in nanoscale regime have been one of the major issues in the modern biosensor. Therefore, to overcome such issue, this study investigates a junctionless dielectrically modulated electrically doped tun
Publikováno v:
Applied Physics A. 125
In this research, to achieve steep subthreshold slope, high $${I}_\mathrm{{on}}/{I}_\mathrm{{off}}$$ ratio and low ambipolarity in TFETs, we have proposed a device which consists of metal strips near drain–channel and source–channel interfaces. T