Zobrazeno 1 - 10
of 292
pro vyhledávání: '"B.H. Wu"'
Autor:
Y.T. Li, C. Z. Chen, Yongxiang Leng, Nan Huang, Q.Y. Deng, P.P. Jing, Y.L. Gong, B.H. Wu, D.L. Ma
Publikováno v:
Vacuum. 160:226-232
Owing to its high ionization degree, high power pulsed magnetron sputtering (HPPMS) has proven advantageous for Cu film growth. In this study, Cu films with different thicknesses deposited by HPPMS at different peak powers were prepared. Moreover, a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::01c930eda3d5f04332a5137d28bb5093
https://doi.org/10.1016/j.vacuum.2018.11.039
https://doi.org/10.1016/j.vacuum.2018.11.039
Akademický článek
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Akademický článek
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Autor:
Yongxiang Leng, C. Z. Chen, Hong Sun, Nan Huang, Y.T. Li, Jian Wu, Y.P. Wu, D.L. Ma, Dong Xie, B.H. Wu
Publikováno v:
Surface and Coatings Technology. 315:258-267
The drawbacks of titanium nitride (TiN) films deposited by high power pulsed magnetron sputtering (HPPMS) are low deposition rate (compared with conventional magnetron sputtering) and high residual stress. Many methods have been used to deal with the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fbc4d9de6151467372de7bbab6299be5
https://doi.org/10.1016/j.surfcoat.2017.02.051
https://doi.org/10.1016/j.surfcoat.2017.02.051
Plasma characteristics and properties of Cu films prepared by high power pulsed magnetron sputtering
Publikováno v:
Vacuum. 135:93-100
Copper (Cu) has been proposed as a well-known material for metallization in Si-based semiconductor devices because of its low resistivity, high chemical stability, and excellent electromigration resistance. In order to improve the properties of Cu fi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e06a2d45717774a4ef22b8d201fe5c46
https://doi.org/10.1016/j.vacuum.2016.10.032
https://doi.org/10.1016/j.vacuum.2016.10.032
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
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Autor:
F.J. Jing, Y.P. Wu, Yongxiang Leng, T.F. Zhang, Y. Yu, Nan Huang, B.H. Wu, Sh.F. Zhu, F. Jiang
Publikováno v:
Surface and Coatings Technology. 292:54-62
For physical surface modification of a complex workpiece, the incoming particles are difficult to arrive at the inclined surface of the complex workpiece due to self-shadowing effect. This will result in the non-uniformity distribution of structure a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eb44c341d8ce16310762166b09a24202
https://doi.org/10.1016/j.surfcoat.2016.03.007
https://doi.org/10.1016/j.surfcoat.2016.03.007
Autor:
Yi Wang, Hong Sun, Yan Ping Wu, Shengfa Zhu, F. Jiang, Yongxiang Leng, Y. Yu, B.H. Wu, F.J. Jing, Nan Huang
Publikováno v:
Surface and Coatings Technology. 281:27-34
Due to the large degree of ionization of the sputtered flux and high quality film fabrication, high power pulsed magnetron sputtering (HPPMS) is widely used. However, compared with DC sputtering, low deposition rate is probably the drawback of the HP
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::18f9609279611844eaefd1ed90423fa4
https://doi.org/10.1016/j.surfcoat.2015.09.038
https://doi.org/10.1016/j.surfcoat.2015.09.038
Autor:
Jin Liu, F. Jiang, Yongxiang Leng, B.H. Wu, Sh. Chen, Hong Sun, Shengfa Zhu, H.L. Sun, Nan Huang, B. Bai, Dong Xie
Publikováno v:
Surface and Coatings Technology. 252:8-14
In order to explore the potential application on cardiovascular stent, titanium oxide films were fabricated on CoCrMo alloy substrate by high power pulsed magnetron sputtering (HPPMS). The effect of Ti interlayer and thickness of Ti–O film on the f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bf982affabaf5f6f9b826170e46e994d
https://doi.org/10.1016/j.surfcoat.2014.04.044
https://doi.org/10.1016/j.surfcoat.2014.04.044
Publikováno v:
Surface and Coatings Technology. 231:443-446
Among popular transparent conducting oxide (TCO) materials, indium tin oxide (ITO) and aluminum-doped zinc oxide (AZO) are expected to be the most applicable for the TCO layer of solar cells due to their resistance to a reductive ambient and their tr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9daa5f51fc46688ba4f600daf2e8b6eb
https://doi.org/10.1016/j.surfcoat.2012.04.046
https://doi.org/10.1016/j.surfcoat.2012.04.046