Zobrazeno 1 - 10
of 37
pro vyhledávání: '"B. Tsujiyama"'
Publikováno v:
IEEE Transactions on Electron Devices. 27:1284-1290
An automatic system for inspecting micro mask defects with 1-µm minimum detectable size has been developed. An outline of the system is as follows: The pattern image obtained with a pickup tube is converted into binary video signals which are transf
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 1:1825-1830
UV‐stimulated photocurrent spectroscopy and photocurrent transient methods have been used to determine the effects of deposition parameters on the electron trapping level density and its energy distribution in rf‐sputtered Ta2O5 films. Results of
Publikováno v:
Journal of The Electrochemical Society. 131:2621-2625
Publikováno v:
Journal of The Electrochemical Society. 132:199-202
Publikováno v:
IEEE Transactions on Magnetics. 13:982-988
A thin film of a new magnetooptical memory medium, Mn-Cu-Bi, was prepared on a glass disk and their dynamic memory characteristics were examined with an experimental rotating disk exerciser. The Curie temperature of the medium was about 200°C. Curie
Publikováno v:
IEEE Transactions on Magnetics. 8:603-605
A study has been made of a magnetooptic disk memory using MnBi thin films. The present experimental device is equipped with a MnBi medium vacuum deposited on a glass disk 139 mm in diameter and 20 mm thick, and with a rotation mechanism in which gas
Publikováno v:
Chemischer Informationsdienst. 16
Publikováno v:
Chemischer Informationsdienst. 16
Autor:
B. Tsujiyama, T. Unagami
Publikováno v:
IEEE Electron Device Letters. 3:167-168
A high voltage enhancement-type thin film transistor (TFT) has been fabricated on quartz in layers of laser-recrystallized polysilicon. The fabrication details and TFT characteristics are described.
Publikováno v:
IEEE Electron Device Letters. 5:197-198
Metal-gate thin-film transistors (TFT's) have been fabricated in layers of laser-recrystallized polycrystalline silicon on fused quartz substrates at processing temperatures below 625°C. Tantalum pentoxide (Ta 2 O 5 ) was used as a gate insulator in