Zobrazeno 1 - 10
of 215
pro vyhledávání: '"B. Schultrich"'
Autor:
B. Schultrich
Publikováno v:
Diamond and Related Materials. 20:785-792
The structure of tetrahedral bonded amorphous carbon (ta-C) is determined by the energy of the impinging carbon ions, the angle of incidence, the substrate temperature and the deposition rate. Up to now modeling of the ta-C growth was concentrated on
Publikováno v:
Wear. 268:955-959
The tribological behaviour of thin films for tribological applications is commonly tested for failure using a variety of model tests and destructive characterisation methods. Typically, these tests are based on strongly simplified mechanical test con
Publikováno v:
Applied Physics A: Materials Science & Processing. 78:675-679
Hydrogen-free amorphous carbon films with hardness up to 75 GPa have been deposited by special pulsed arc techniques. The influence of plasma and deposition conditions on the film properties is discussed and some applications are shown.
Autor:
Ioannis Alexandrou, Adam J. Papworth, Christopher J. Kiely, H.-J. Scheibe, Gehan A. J. Amaratunga, B. Schultrich
Publikováno v:
Physical Review B. 60:10903-10907
Laser-arc evaporation of a graphite target has been used to deposit carbon films that exhibit high hardness (45 GPa) and elastic recovery (85%). High-resolution electron microscopy (HREM) and electron energy loss spectroscopy (EELS) were subsequently
Autor:
B. Schultrich
Publikováno v:
Contributions to Plasma Physics. 39:463-472
Physical Vapor Deposition (PVD) based on laser pulses or vacuum arc discharges are distinguished by the highly (often completely) ionization of the plasma beam with high ion energies. Hence, with comparable plasma parameters both processes give compa
Autor:
J. Jojic, S. Scherrer, Günter Borchardt, B. Schultrich, T. Witke, S. Weber, R. Weiß, Holger Fritze, Claus H. Rüscher
Publikováno v:
Journal of the European Ceramic Society. 18:2351-2364
For an industrial Si-SiC coated C/C material (reference material) the temperature dependence of the linear rate of mass loss is interpreted in the temperature range 773 < T < 1973 K. The Arrhenius plot of the thermogravimetrically determined oxidatio
Autor:
E. Shefer, Yeshayahu Lifshitz, G. Lempert, E. Grossman, Alon Hoffman, Rachel Chechik, H.-J. Scheibe, D. Bacon, B. Schultrich, Rafi Kalish, Amos Breskin, S. Voellmar
Publikováno v:
Diamond and Related Materials. 6:687-693
The optical and photoemission properties of hydrogen-free DLC films prepared under conditions which result in different types of carbon bonding (previously determined from electron energy loss spectroscopy) are reported. The films were prepared using
Publikováno v:
Applied Surface Science. :419-423
The main advantage of the PLD process consists in thin film deposition by a plasma flow with high kinetic particle energy. The energy and mass balance of the particle beam formation generated by laser ablation is the key for qualitative and quantitat
Publikováno v:
International Journal of Adhesion and Adhesives. 17:203-206
The demands on adhesive joints and for their long-term durability, especially under extreme environmental conditions, are steadily increasing. Most of the currently used chemical methods of adherend surface pretreatment that lead to high values of st
Publikováno v:
Surface and Coatings Technology. :813-818
The laser-induced vacuum arc (Laser Arc) is a pulsed arc plasma source for thin film deposition, using a pulse laser for arc ignition on the cathode with a high repetition rate, for moving the spot over the cathode surface and optimizing the exploita