Zobrazeno 1 - 10
of 48
pro vyhledávání: '"B. M. Fanconi"'
Autor:
William E. Wallace, Kathleen M. Flynn, B M. Fanconi, Charles M. Guttman, David L. VanderHart, Stephanie J. Wetzel
Publikováno v:
Analytical Chemistry. 77:4539-4548
A matrix-assisted laser desorption/ionization time-of-flight mass spectrometry (MALDI-TOF MS) interlaboratory comparison was conducted on mixtures of synthetic polymers having the same repeat unit and closely matching molecular mass distributions but
Autor:
William E. Wallace, B M. Fanconi, Charles M. Guttman, Lorenz Brunner, Barry J. Bauer, David L. VanderHart, Sheng Lin-Gibson
Publikováno v:
Macromolecules. 35:7149-7156
Previously a new method was introduced for the mass spectrometry of saturated polyolefins whereby an organic cation is covalently bonded to the polymer to produce the necessary ionization for the creation of intact gas-phase macromolecules by matrix-
Publikováno v:
Polymer. 42:09949-09953
Polyethylene and other polyolefins have not been amenable to mass spectrometric characterization of molecular mass distribution due to the ineffectiveness of conventional methods of cationization. The lack of polar groups, unsaturation, and aromatici
Autor:
and William E. Wallace, Stephanie J. Wetzel, William R. Blair, B M. Fanconi, David L. VanderHart, R J. Goldschmidt, James E. Girard, Charles M. Guttman
Publikováno v:
Analytical Chemistry. 73:1252-1262
The method of preparation and methods of analysis of a narrow distribution polystyrene of ∼7 ku used in an interlaboratory comparison of matrix-assisted laser desorption/ionization time-of-flight mass spectrometry (MALDI-TOF-MS) of synthetic polyme
Publikováno v:
Journal of Polymer Science Part B: Polymer Physics. 32:2475-2480
The density profiles of polymethylmethacrylate (PMMA) thin films on silicon (111) single crystal wafers were investigated via neutron reflectivity measurements. Films were prepared by spin casting PMMA onto silicon wafers from o-xylene solution follo
Autor:
B M. Fanconi, Charles M. Guttman
Publikováno v:
Encyclopedia of Applied Physics
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dc68636689c40f85107c5c3668606f9f
https://doi.org/10.1002/3527600434.eap353
https://doi.org/10.1002/3527600434.eap353
Autor:
J. K. Lan, Wen-Li Wu, M. S. Feng, C. G. Chao, Y. L. Cheng, B. M. Fanconi, Hae-Jeong Lee, Y. L. Wang, E. K. Lin, Huey-Chiang Liou
Publikováno v:
MRS Proceedings. 714
The density depth profile and chemical bond structure of hydrogen silsesquioxane (HSQ) thin films treated with an N2 plasma with varying power and exposure time were measured using specular x-ray reflectivity (SXR) and Fourier transform infrared (FTI