Zobrazeno 1 - 10
of 48
pro vyhledávání: '"B. Gorenstein"'
Publikováno v:
Applied Surface Science. 315:523-526
The main problems preventing wide spreading of solar cells as alternative energy sources are their high cost and low efficiency. Efficiency of solar cells based on semiconductor materials is limited due to high electrical and optical losses and due t
Publikováno v:
Microelectronics Reliability. 51:2119-2123
Vanadium oxide VO2 is a material that transforms from semiconductor to a metal state at a temperature of 67 °C. This phase transformation is accompanied by a dramatic change in its electrical and optical properties. Therefore, vanadium oxide thin fi
Publikováno v:
Thin Solid Films. 518:4520-4524
Zinc oxide (ZnO) thin films have attracted great attention in recent years due to their unique piezoelectric and piezooptic properties, making them suitable for various microelectronics and optoelectronics applications, such as surface acoustic wave
Publikováno v:
Thin Solid Films. 515:8446-8449
In this work we present first results on the synthesis of vanadium oxide semi-transparent conducting thin films of p - and n -types. The films were deposited by thermal evaporation method in vacuum, on: silicon, glass, sapphire, and gold substrates.
Publikováno v:
Applied Surface Science. 253:6608-6611
Transparent conductive oxide (TCO) thin films play a significant role in recent optical technologies. Displays of various types, photovoltaic systems, and opto-electronic devices use these films as transparent signal electrodes. They are used as heat
Publikováno v:
Microelectronics Journal. 37:1538-1542
Silicon carbide (SiC) is becoming one of the most important electronic materials in recent years. Single crystalline SiC is a wide-bandgap semiconductor, which finds a wide range of applications in high temperature, power consuming, and fast-acting e
Publikováno v:
Microelectronics Journal. 37:910-915
Electrical, optical, and mechanical properties of thin films significantly differ from those of bulk materials. Therefore, characterization methods for evaluation of thin film properties became highly important. A novel approach to the well known “
Publikováno v:
Plasma Devices and Operations. 13:9-18
Low-pressure plane plasma discharge is a novel technique for thin film growth. It makes possible fine control of most of the sputtering parameters, as well as supporting a high growth rate. A low-pressure plane argon plasma was obtained in a triode s
Publikováno v:
Microelectronics Journal. 34:255-258
Vanadium oxide films (VO 2 ) are of a typical phase transition ranging between metal phase to a semi-conducting phase. The theoretical metamorphose temperature of VO 2 is around 340 K (67 °C). This transition temperature is mostly governed by the de
Publikováno v:
Microelectronics Reliability. 43:509-512
A novel system of integrated thin-film heater with an embedded thermocouple was developed. Thin-film metallic heaters are widely used today in various fields of electronics and microelectronics applications. The main goal of the heater is usually to